Pre- and post-BD electrical conduction of stressed HfO2/SiO2 MOS gate stacks observed at the nanoscale
2005 ◽
Vol 45
(9-11)
◽
pp. 1390-1393
◽
Charge trapping and degradation of HfO/sub 2//SiO/sub 2/ MOS gate stacks observed with enhanced CAFM
2006 ◽
Vol 27
(3)
◽
pp. 157-159
◽
2017 ◽
Vol 38
(3)
◽
pp. 318-321
◽
Keyword(s):
2007 ◽
Vol 84
(9-10)
◽
pp. 2408-2411
◽
2014 ◽
Vol 32
(3)
◽
pp. 03D105
◽
2007 ◽