Influence of substrate bias voltage on structure and properties of hard Si–B–C–N films prepared by reactive magnetron sputtering

J. Houška; J. Vlček; Š. Potocký; V. Peřina

doi:10.1016/j.diamond.2006.03.012

Influence of substrate bias voltage on structure and properties of hard Si–B–C–N films prepared by reactive magnetron sputtering

Diamond and Related Materials ◽

10.1016/j.diamond.2006.03.012 ◽

2007 ◽

Vol 16 (1) ◽

pp. 29-36 ◽

Cited By ~ 41

Author(s):

J. Houška ◽

J. Vlček ◽

Š. Potocký ◽

V. Peřina

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Reactive Magnetron Sputtering ◽

Substrate Bias ◽

Reactive Magnetron ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Influence Of Substrate

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Influence of substrate bias voltage on the properties of CNx films prepared by reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581662 ◽

1999 ◽

Vol 17 (3) ◽

pp. 899-908 ◽

Cited By ~ 27

Author(s):

V. Hajek ◽

K. Rusnak ◽

J. Vlcek ◽

L. Martinu ◽

S. C. Gujrathi

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Reactive Magnetron Sputtering ◽

Substrate Bias ◽

Reactive Magnetron ◽

Substrate Bias Voltage ◽

Cnx Films ◽

Influence Of Substrate

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Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2012.07.064 ◽

2012 ◽

Vol 259 ◽

pp. 448-453 ◽

Cited By ~ 15

Author(s):

Xiufeng Tang ◽

Fa Luo ◽

Fang Ou ◽

Wancheng Zhou ◽

Dongmei Zhu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Aluminum Oxide ◽

Bias Voltage ◽

Reactive Magnetron Sputtering ◽

Substrate Bias ◽

Reactive Magnetron ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Dc Reactive Magnetron Sputtering ◽

Negative Substrate Bias

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Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2011.12.048 ◽

2012 ◽

Vol 258 (8) ◽

pp. 3864-3870 ◽

Cited By ~ 58

Author(s):

Yanhong Lv ◽

Li Ji ◽

Xiaohong Liu ◽

Hongxuan Li ◽

Huidi Zhou ◽

...

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Substrate Bias ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Influence Of Substrate

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Influence of substrate bias voltage on structure and properties of Cr–Mo–Si–N coatings prepared by a hybrid coating system

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2008.06.125 ◽

2008 ◽

Vol 203 (5-7) ◽

pp. 624-627 ◽

Cited By ~ 16

Author(s):

Seung Gyun Hong ◽

Se-Hun Kwon ◽

Sang-Won Kang ◽

Kwang Ho Kim

Keyword(s):

Bias Voltage ◽

Hybrid Coating ◽

Coating System ◽

Substrate Bias ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Influence Of Substrate

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Influence of substrate bias voltage on the properties of TiO 2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications

Applied Surface Science ◽

10.1016/j.apsusc.2016.07.101 ◽

2017 ◽

Vol 395 ◽

pp. 72-77 ◽

Cited By ~ 21

Author(s):

L. Bait ◽

L. Azzouz ◽

N. Madaoui ◽

N. Saoula

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Radio Frequency Magnetron ◽

Substrate Bias ◽

Radio Frequency Magnetron Sputtering ◽

Substrate Bias Voltage ◽

Influence Of Substrate

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Effect of negative substrate bias voltage on the structure and properties of CrN films deposited by modulated pulsed power (MPP) magnetron sputtering

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/44/42/425305 ◽

2011 ◽

Vol 44 (42) ◽

pp. 425305 ◽

Cited By ~ 26

Author(s):

J Lin ◽

W D Sproul ◽

J J Moore ◽

Z L Wu ◽

S L Lee

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Pulsed Power ◽

Substrate Bias ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Negative Substrate Bias

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Influence of substrate bias voltage on crystallographic structure, optical and electronic properties of Al/(Ta 2 O 5 ) 0.85 (TiO 2 ) 0.15 /p-Si MIS Schottky barrier diodes fabricated by dc magnetron sputtering

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2018.01.001 ◽

2018 ◽

Vol 76 ◽

pp. 80-86 ◽

Cited By ~ 6

Author(s):

M. Chandra Sekhar ◽

N. Nanda Kumar Reddy ◽

B. Purusottam Reddy ◽

B. Poorna Prakash ◽

Harish Sharma Akkera ◽

...

Keyword(s):

Magnetron Sputtering ◽

Electronic Properties ◽

Schottky Barrier ◽

Bias Voltage ◽

Crystallographic Structure ◽

Substrate Bias ◽

Dc Magnetron Sputtering ◽

Substrate Bias Voltage ◽

Optical And Electronic Properties ◽

Influence Of Substrate

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Reactive Magnetron Sputter Deposition of Titanium Oxynitride TiNxOy Coatings: Influence of Substrate Bias Voltage on the Structure, Composition, and Properties

Protection of Metals and Physical Chemistry of Surfaces ◽

10.1134/s207020511904018x ◽

2019 ◽

Vol 55 (4) ◽

pp. 743-747

Author(s):

N. Saoula ◽

L. Bait ◽

S. Sali ◽

M. Azibi ◽

A. Hammouche ◽

...

Keyword(s):

Bias Voltage ◽

Sputter Deposition ◽

Substrate Bias ◽

Reactive Magnetron ◽

Substrate Bias Voltage ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter ◽

Influence Of Substrate

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Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering

Materials Science and Engineering B ◽

10.1016/j.mseb.2011.04.015 ◽

2011 ◽

Vol 176 (11) ◽

pp. 850-854 ◽

Cited By ~ 47

Author(s):

Qinghua Kong ◽

Li Ji ◽

Hongxuan Li ◽

Xiaohong Liu ◽

Yongjun Wang ◽

...

Keyword(s):

Residual Stress ◽

Magnetron Sputtering ◽

Bias Voltage ◽

Substrate Bias ◽

Medium Frequency ◽

Substrate Bias Voltage ◽

Influence Of Substrate

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Influence of substrate bias voltage on structure and properties of DC magnetron sputtered Ni–Zr alloy thin films

Journal of Materials Research ◽

10.1557/jmr.2020.89 ◽

2020 ◽

Vol 35 (12) ◽

pp. 1543-1555 ◽

Cited By ~ 2

Author(s):

Bibhu Prasad Sahu ◽

Amlan Dutta ◽

Rahul Mitra

Keyword(s):

Thin Films ◽

Bias Voltage ◽

Substrate Bias ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Influence Of Substrate ◽

Image Position ◽

Zr Alloy

Abstract

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