Influence of substrate bias voltage on the properties of TiO 2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications

2017 ◽  
Vol 395 ◽  
pp. 72-77 ◽  
Author(s):  
L. Bait ◽  
L. Azzouz ◽  
N. Madaoui ◽  
N. Saoula
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Bias Voltage ◽  
Radio Frequency Magnetron ◽  
Substrate Bias ◽  
Radio Frequency Magnetron Sputtering ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate

scholarly journals The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

2019 ◽  
Vol 70 (7) ◽  
pp. 112-116
Author(s):  
Mourad Azibi ◽  
Nadia Saoula ◽  
Hamid Aknouche
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Electrochemical Properties ◽  
Bias Voltage ◽  
Biomedical Application ◽  
Substrate Bias ◽  
Radio Frequency Magnetron Sputtering ◽  
Substrate Bias Voltage ◽  
Force Microscopy

Abstract In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

Sign in / Sign up

Export Citation Format

Share Document