Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

2012 ◽  
Vol 259 ◽  
pp. 448-453 ◽  
Author(s):  
Xiufeng Tang ◽  
Fa Luo ◽  
Fang Ou ◽  
Wancheng Zhou ◽  
Dongmei Zhu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Aluminum Oxide ◽  
Bias Voltage ◽  
Reactive Magnetron Sputtering ◽  
Substrate Bias ◽  
Reactive Magnetron ◽  
Structure And Properties ◽  
Substrate Bias Voltage ◽  
Dc Reactive Magnetron Sputtering ◽  
Negative Substrate Bias

Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage

2011 ◽  
Vol 189-193 ◽  
pp. 668-671
Author(s):  
Ming Sheng Li ◽  
Yong Zhong Fan ◽  
Shu Juan Zhang ◽  
Chang Jie Feng
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
High Hardness ◽  
Substrate Bias ◽  
Dense Structure ◽  
Substrate Bias Voltage ◽  
Structure And Property ◽  
Excellent Adhesion ◽  
Mechanical Performances ◽  
Negative Substrate Bias

Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings.

Corrosion studies of DC reactive magnetron sputtered alumina coating on 304 SS

2017 ◽  
Vol 3 (1) ◽  
Author(s):  
Baskar Thangaraj ◽  
Krishnan Mahadevan
Keyword(s):  
Magnetron Sputtering ◽  
Aluminum Oxide ◽  
Oxide Films ◽  
Reactive Magnetron Sputtering ◽  
Alumina Coating ◽  
Reactive Magnetron ◽  
Corrosion Studies ◽  
Dc Reactive Magnetron Sputtering ◽  
Ss 304

AbstractAluminum oxide films on SS 304 deposited by DC reactive magnetron sputtering technique were studied with respect to the composition of the sputter gas (Ar:O

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