The role of the low temperature buffer layer and layer thickness in the optimization of OMVPE growth of GaN on sapphire

1995 ◽  
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C. Kranenberg ◽  
K. Malloy ◽  
...  
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ABSTRACTIn this work it is shown that thin AlN buffer layers cause N-polarity GaN epilayers, with a high inversion domains density. When the AlN thickness increases, the polarity of the epilayer changes to Ga. The use of a low temperature AlN nucleation layer leads to a flat AlN/Si(111) interface. This contributes to decrease the inversion domains density in the overgrown GaN epilayer with a Ga polarity.


Langmuir ◽  
2017 ◽  
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Sk. Ziaur Rahaman ◽  
Yu-De Lin ◽  
Heng-Yuan Lee ◽  
Yu-Sheng Chen ◽  
Pang-Shiu Chen ◽  
...  

2003 ◽  
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N Gopalakrishnan ◽  
K Baskar ◽  
H Kawanami ◽  
I Sakata

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Aibin Yu ◽  
...  

2008 ◽  
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Z. H. Wu ◽  
A. M. Fischer ◽  
F. A. Ponce ◽  
T. Yokogawa ◽  
S. Yoshida ◽  
...  

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