Surface contamination and damage from CF4 and SF6 reactive ion etching of silicon oxide on gallium arsenide

1990 ◽  
Vol 19 (4) ◽  
pp. 385-391 ◽  
Author(s):  
K. L. Seaward ◽  
N. J. Moll ◽  
W. F. Stickle
Keyword(s):  
Gallium Arsenide ◽  
Silicon Oxide ◽  
Reactive Ion Etching ◽  
Surface Contamination ◽  
Ion Etching

Radiation damage of gallium arsenide induced by reactive ion etching

1987 ◽  
Vol 62 (10) ◽  
pp. 4109-4113 ◽  
Author(s):  
Tohru Hara ◽  
Hidenori Suzuki ◽  
Akio Suga ◽  
Toshiyuki Terada ◽  
Nobuyuki Toyoda
Keyword(s):  
Gallium Arsenide ◽  
Radiation Damage ◽  
Reactive Ion Etching ◽  
Ion Etching

Removal of surface contamination after reactive ion etching of silicon dioxide

Vacuum ◽  
1994 ◽  
Vol 45 (5) ◽  
pp. 519-524 ◽  
Author(s):  
R Jackson ◽  
AJ Pidduck ◽  
MA Green
Keyword(s):  
Silicon Dioxide ◽  
Reactive Ion Etching ◽  
Surface Contamination ◽  
Ion Etching

Electron Beam Induced Current Imaging of Silicon Oxide Damage Due to Reactive Ion Etching

1996 ◽  
Vol 51-52 ◽  
pp. 359-366
Author(s):  
Hary Kirk ◽  
Zbigniew J. Radzimski ◽  
A. Romanowski ◽  
George A. Rozgonyi
Keyword(s):  
Electron Beam ◽  
Silicon Oxide ◽  
Reactive Ion Etching ◽  
Induced Current ◽  
Ion Etching ◽  
Electron Beam Induced Current ◽  
Oxide Damage

Assessment of Surface Damage of Gallium Arsenide due to Reactive Ion Etching

1990 ◽  
Vol 190 ◽  
Author(s):  
M. S. Puttock ◽  
H. Thomas ◽  
D. V. Morgan ◽  
U. Rossow ◽  
D. R. T. Zahn ◽  
...  
Keyword(s):  
Gallium Arsenide ◽  
Reactive Ion Etching ◽  
Surface Damage ◽  
Ion Etching
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