Nonstandard temperature dependence of the impurity-band hopping Hall mobility

1991 ◽  
Vol 41 (9) ◽  
pp. 847-853 ◽  
Author(s):  
V. Čápek
1981 ◽  
Vol 42 (C4) ◽  
pp. C4-99-C4-102
Author(s):  
M. Grünewald ◽  
H. Müller ◽  
P. Thomas ◽  
D. Würtz

1993 ◽  
Vol 5 (45) ◽  
pp. 8545-8556
Author(s):  
V Capek ◽  
L Vodna
Keyword(s):  

2005 ◽  
Vol 483-485 ◽  
pp. 401-404 ◽  
Author(s):  
Julien Pernot ◽  
Sylvie Contreras ◽  
Jean Camassel ◽  
Jean-Louis Robert

We report a detailed investigation of the electrical properties of p-type 4H-SiC. In the range 100 K-800 K we show that, both, the temperature dependence of the hole concentration and Hall mobility is satisfactorily described using the relaxation time approximation. Performing a detailed comparison of in-situ vs. implantation doping, we evidence an incomplete activation of the dose (about 50 ±10 %) with apparition of a large number of compensating centres in the implanted layers.


1998 ◽  
Vol 83 (1) ◽  
pp. 292-296 ◽  
Author(s):  
H. Nussbaumer ◽  
F. P. Baumgartner ◽  
G. Willeke ◽  
E. Bucher

1996 ◽  
Vol 421 ◽  
Author(s):  
Wim Geerts ◽  
J.D. MacKenzie ◽  
C.R. Abernathy ◽  
S.J Pearton ◽  
Thomas Schmiedel

AbstractThe temperature dependence of the Hall voltage and resistivity of highly carbon doped GaN were measured. From the sign of the Hall voltage, the material appears to be p-type. Charge transport takes place in an impurity band and the valence band. The effective activation energy as estimated from the maximum in the temperature versus Hall voltage relation is 10–30 meV.


1995 ◽  
Vol 5 (6) ◽  
pp. 861 ◽  
Author(s):  
Kenichi Imaeda ◽  
Yongfang Li ◽  
Yoshiro Yamashita ◽  
Hiroo Inokuchi ◽  
Mizuka Sano

1997 ◽  
Vol 82 (8) ◽  
pp. 3832-3835 ◽  
Author(s):  
W. Siegel ◽  
S. Schulte ◽  
C. Reichel ◽  
G. Kühnel ◽  
J. Monecke

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