Thermochemistry of thermal plasma chemical reactions. Part II. A survey of synthesis routes for silicon nitride production

Yl Chang; R. M. Young; E. Pfender

doi:10.1007/bf01016519

Thermochemistry of thermal plasma chemical reactions. Part II. A survey of synthesis routes for silicon nitride production

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01016519 ◽

1987 ◽

Vol 7 (3) ◽

pp. 299-316 ◽

Cited By ~ 22

Author(s):

Yl Chang ◽

R. M. Young ◽

E. Pfender

Keyword(s):

Silicon Nitride ◽

Chemical Reactions ◽

Thermal Plasma ◽

Plasma Chemical ◽

Synthesis Routes

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Thermochemistry of thermal plasma chemical reactions. Part I. General rules for the prediction of products

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01016518 ◽

1987 ◽

Vol 7 (3) ◽

pp. 275-297 ◽

Cited By ~ 12

Author(s):

Yl Chang ◽

E. Pfender

Keyword(s):

Chemical Reactions ◽

Thermal Plasma ◽

Plasma Chemical ◽

General Rules

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POSSIBILITY OF COMPOSITE SILICON NITRIDE + SILICON CARBIDE (Si3 N4SiC) POWDER PRODUCTION IN THERMAL PLASMA

High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) ◽

10.1615/hightempmatproc.v15.i4.90 ◽

2011 ◽

Vol 15 (4) ◽

pp. 321-328 ◽

Cited By ~ 3

Author(s):

Zivota G. Kostic ◽

Predrag Lj. Stefanovic ◽

Pavle B. Pavlovic ◽

Dejan B. Cvetinovic

Keyword(s):

Silicon Carbide ◽

Silicon Nitride ◽

Thermal Plasma ◽

Powder Production ◽

Composite Silicon

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Process study of thermal plasma chemical vapor deposition of diamond, part II: Pressure dependence and effect of substrate pretreatment

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01447944 ◽

1992 ◽

Vol 12 (1) ◽

pp. 55-69 ◽

Cited By ~ 14

Author(s):

Z. P. Lu ◽

J. Heberlien ◽

E. Pfender

Keyword(s):

Chemical Vapor Deposition ◽

Pressure Dependence ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Process Study ◽

Substrate Pretreatment

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Carbon and Oxygen Isotope Separation by Plasma Chemical Reactions in Carbon Monoxide Glow Discharge

Journal of Nuclear Science and Technology ◽

10.1080/18811248.2001.9715105 ◽

2001 ◽

Vol 38 (10) ◽

pp. 850-858 ◽

Cited By ~ 10

Author(s):

Shinsuke MORI ◽

Hiroshi AKATSUKA ◽

Masaaki SUZUKI

Keyword(s):

Carbon Monoxide ◽

Glow Discharge ◽

Oxygen Isotope ◽

Chemical Reactions ◽

Isotope Separation ◽

Plasma Chemical ◽

Carbon And Oxygen Isotope

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Temperature mapping of reactive gas layer in thermal plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.365687 ◽

1997 ◽

Vol 82 (7) ◽

pp. 3560-3566 ◽

Cited By ~ 4

Author(s):

Jussi Larjo ◽

Joachim Walewski ◽

Rolf Hernberg

Keyword(s):

Chemical Vapor Deposition ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Temperature Mapping ◽

Gas Layer ◽

Reactive Gas

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Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1393382 ◽

2000 ◽

Vol 147 (4) ◽

pp. 1481 ◽

Cited By ~ 39

Author(s):

J. W. Lee ◽

K. D. Mackenzie ◽

D. Johnson ◽

J. N. Sasserath ◽

S. J. Pearton ◽

...

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Dioxide Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Dioxide Film

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Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH2F2and NH3Source Gases

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.l619 ◽

1991 ◽

Vol 30 (Part 2, No. 4A) ◽

pp. L619-L621 ◽

Cited By ~ 5

Author(s):

Nobuaki Watanabe ◽

Mamoru Yoshida ◽

Yi-Chao Jiang ◽

Tutomu Nomoto ◽

Ichimatsu Abiko

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Nitride Films

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Elementary Plasma-Chemical Reactions

Plasma Chemistry ◽

10.1017/cbo9780511546075.004 ◽

2009 ◽

pp. 12-91 ◽

Cited By ~ 3

Author(s):

Alexander Fridman

Keyword(s):

Chemical Reactions ◽

Plasma Chemical

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Two-dimensional model for thermal plasma chemical vapor deposition

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01512627 ◽

1995 ◽

Vol 16 (S1) ◽

pp. S57-S69 ◽

Cited By ~ 11

Author(s):

D. Kolman ◽

J. Heberlein ◽

E. Pfender ◽

R. Young

Keyword(s):

Chemical Vapor Deposition ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Two Dimensional ◽

Dimensional Model ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Two Dimensional Model

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High-density inductively coupled plasma chemical vapor deposition of silicon nitride for solar cell application

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(02)00053-3 ◽

2002 ◽

Vol 74 (1-4) ◽

pp. 97-105 ◽

Cited By ~ 22

Author(s):

I.O Parm ◽

K Kim ◽

D.G Lim ◽

J.H Lee ◽

J.H Heo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Solar Cell ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Solar Cell Application ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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