Thermochemistry of thermal plasma chemical reactions. Part I. General rules for the prediction of products

Yl Chang; E. Pfender

doi:10.1007/bf01016518

Thermochemistry of thermal plasma chemical reactions. Part I. General rules for the prediction of products

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01016518 ◽

1987 ◽

Vol 7 (3) ◽

pp. 275-297 ◽

Cited By ~ 12

Author(s):

Yl Chang ◽

E. Pfender

Keyword(s):

Chemical Reactions ◽

Thermal Plasma ◽

Plasma Chemical ◽

General Rules

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Thermochemistry of thermal plasma chemical reactions. Part II. A survey of synthesis routes for silicon nitride production

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01016519 ◽

1987 ◽

Vol 7 (3) ◽

pp. 299-316 ◽

Cited By ~ 22

Author(s):

Yl Chang ◽

R. M. Young ◽

E. Pfender

Keyword(s):

Silicon Nitride ◽

Chemical Reactions ◽

Thermal Plasma ◽

Plasma Chemical ◽

Synthesis Routes

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Process study of thermal plasma chemical vapor deposition of diamond, part II: Pressure dependence and effect of substrate pretreatment

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01447944 ◽

1992 ◽

Vol 12 (1) ◽

pp. 55-69 ◽

Cited By ~ 14

Author(s):

Z. P. Lu ◽

J. Heberlien ◽

E. Pfender

Keyword(s):

Chemical Vapor Deposition ◽

Pressure Dependence ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Process Study ◽

Substrate Pretreatment

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Carbon and Oxygen Isotope Separation by Plasma Chemical Reactions in Carbon Monoxide Glow Discharge

Journal of Nuclear Science and Technology ◽

10.1080/18811248.2001.9715105 ◽

2001 ◽

Vol 38 (10) ◽

pp. 850-858 ◽

Cited By ~ 10

Author(s):

Shinsuke MORI ◽

Hiroshi AKATSUKA ◽

Masaaki SUZUKI

Keyword(s):

Carbon Monoxide ◽

Glow Discharge ◽

Oxygen Isotope ◽

Chemical Reactions ◽

Isotope Separation ◽

Plasma Chemical ◽

Carbon And Oxygen Isotope

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Temperature mapping of reactive gas layer in thermal plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.365687 ◽

1997 ◽

Vol 82 (7) ◽

pp. 3560-3566 ◽

Cited By ~ 4

Author(s):

Jussi Larjo ◽

Joachim Walewski ◽

Rolf Hernberg

Keyword(s):

Chemical Vapor Deposition ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Temperature Mapping ◽

Gas Layer ◽

Reactive Gas

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Elementary Plasma-Chemical Reactions

Plasma Chemistry ◽

10.1017/cbo9780511546075.004 ◽

2009 ◽

pp. 12-91 ◽

Cited By ~ 3

Author(s):

Alexander Fridman

Keyword(s):

Chemical Reactions ◽

Plasma Chemical

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Two-dimensional model for thermal plasma chemical vapor deposition

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01512627 ◽

1995 ◽

Vol 16 (S1) ◽

pp. S57-S69 ◽

Cited By ~ 11

Author(s):

D. Kolman ◽

J. Heberlein ◽

E. Pfender ◽

R. Young

Keyword(s):

Chemical Vapor Deposition ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Two Dimensional ◽

Dimensional Model ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Two Dimensional Model

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Corrigendum to “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells”

International Journal of Photoenergy ◽

10.1155/2015/321702 ◽

2015 ◽

Vol 2015 ◽

pp. 1-1

Author(s):

K. Sharma ◽

B. L. Williams ◽

A. Mittal ◽

H. C. M. Knoops ◽

B. J. Kniknie ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapour Deposition ◽

Thermal Plasma ◽

Vapour Deposition ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Cigs Solar Cells

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The effects of substrate rotation on thermal plasma chemical vapor deposition of diamond

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01176-8 ◽

2001 ◽

Vol 142-144 ◽

pp. 724-732 ◽

Cited By ~ 5

Author(s):

M. Asmann ◽

C.F.M. Borges ◽

J. Heberlein ◽

E. Pfender

Keyword(s):

Chemical Vapor Deposition ◽

Thermal Plasma ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Substrate Rotation

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Deposition of Silicon Oxide Films with High Quality of Step Coverage by Nonequilibrium Plasma Chemical Reactions Using Pulsed Silent Discharge.

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series B ◽

10.1299/kikaib.65.3814 ◽

1999 ◽

Vol 65 (639) ◽

pp. 3814-3820 ◽

Cited By ~ 1

Author(s):

Kazuhiro ISHIMARU ◽

Ken OKAZAKI

Keyword(s):

Chemical Reactions ◽

Silicon Oxide ◽

Oxide Films ◽

Nonequilibrium Plasma ◽

Plasma Chemical ◽

High Quality ◽

Silent Discharge ◽

Step Coverage

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Thermal plasma chemical vapour deposition for SiC powders from SiCH3Cl3-H2

Journal of Materials Science ◽

10.1007/bf01130141 ◽

1991 ◽

Vol 26 (21) ◽

pp. 5957-5964 ◽

Cited By ~ 6

Author(s):

Hyuk-Sang Park ◽

Hong-Sun Seon ◽

Shi-Woo Rhee ◽

Kun-Hong Lee ◽

Sunggi Baik

Keyword(s):

Chemical Vapour Deposition ◽

Thermal Plasma ◽

Vapour Deposition ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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