Interference method of measuring transparent dielectric film thickness

1982 ◽  
Vol 25 (4) ◽  
pp. 304-305
Author(s):  
A. I. Sergeeva
Keyword(s):  
Film Thickness ◽  
Dielectric Film ◽  
Interference Method ◽  
Transparent Dielectric

Automatic interference method for measuring transparent film thickness

1993 ◽  
Vol 32 (13) ◽  
pp. 2292 ◽  
Author(s):  
A. González-Cano ◽  
E. Bernabéu
Keyword(s):  
Film Thickness ◽  
Interference Method ◽  
Transparent Film

Flexible and Transparent Dielectric Film with a High Dielectric Constant Using Chemical Vapor Deposition-Grown Graphene Interlayer

ACS Nano ◽  
2013 ◽  
Vol 8 (1) ◽  
pp. 269-274 ◽  
Author(s):  
Jin-Young Kim ◽  
Jongho Lee ◽  
Wi Hyoung Lee ◽  
Iskandar N. Kholmanov ◽  
Ji Won Suk ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Dielectric Constant ◽  
Dielectric Film ◽  
Chemical Vapor ◽  
Transparent Dielectric ◽  
Grown Graphene ◽  
High Dielectric

Accurate monitoring of dielectric film thickness

Vacuum ◽  
1995 ◽  
Vol 46 (2) ◽  
pp. 199-201 ◽  
Author(s):  
OS Heavens ◽  
GJ Kopek ◽  
Yuan Yi-Fang
Keyword(s):  
Film Thickness ◽  
Dielectric Film

A Computational Model to Study Film Formation and Debris Flushing Phenomena in Spray-Electric Discharge Machining

2016 ◽  
Vol 4 (3) ◽  
Author(s):  
Arvind Pattabhiraman ◽  
Deepak Marla ◽  
Shiv G. Kapoor
Keyword(s):  
Film Thickness ◽  
Computational Model ◽  
Electric Discharge ◽  
Dielectric Film ◽  
Film Formation ◽  
Electric Discharge Machining ◽  
Spray Formation ◽  
Spray System ◽  
Debris Particles ◽  
Interelectrode Gap

A computational model to investigate the flushing of electric discharge machining (EDM) debris from the interelectrode gap during the spray-EDM process is developed. Spray-EDM differs from conventional EDM in that an atomized dielectric spray is used to generate a thin film that penetrates the interelectrode gap. The debris flushing in spray-EDM is investigated by developing models for three processes, viz., dielectric spray formation, film formation, and debris flushing. The range of spray system parameters including gas pressure and impingement angle that ensure formation of dielectric film on the surface is identified followed by the determination of dielectric film thickness and velocity. The debris flushing in conventional EDM with stationary dielectric and spray-EDM processes is then compared. It is observed that the dielectric film thickness and velocity play a significant role in removing the debris particles from the machining region. The model is used to determine the spray conditions that result in enhanced debris flushing with spray-EDM.

scholarly journals Influence of Carbon Quantum Dots on the Electrical Performance of Triboelectric Generators

Proceedings ◽  
2018 ◽  
Vol 2 (13) ◽  
pp. 1025 ◽  
Author(s):  
Vasiliki Prifti ◽  
Antigoni Siaraka ◽  
Aikaterini Giannouli ◽  
Apostolos Segkos ◽  
Achilleas Bardakas ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Quantum Dots ◽  
Film Thickness ◽  
Potential Application ◽  
Dielectric Film ◽  
Sliding Mode ◽  
Flexible Substrate ◽  
Carbon Quantum Dots ◽  
Electrical Performance ◽  
Device Performance

In this work we investigate the triboelectric properties of Carbon Quantum Dots (CQDs) films for potential application in triboelectric generators. CQDs were deposited on silicon wafers, using spin on techniques. Device performance was estimated in sliding mode experiments, where the CQDs-surface was sliding on top of a flexible substrate. The triboelectric signal as well as the charging of capacitors, after signal rectification, was monitored as a function of time. Our results indicate that surface roughness plays a very important role in the triboelectric signal and could compensate opposite trends due to other parameters, such as the dielectric film thickness.

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