In situ method for real time measurement of dielectric film thickness in plasmas

2010 ◽  
Vol 107 (2) ◽  
pp. 023303 ◽  
Keyword(s):  
Film Thickness ◽  
Real Time ◽  
Dielectric Film ◽  
Time Measurement ◽  
Real Time Measurement ◽  
In Situ Method

Study of Real-Time Measurement for Thickness of Coating Film Based on Quartz Crystal Oscillator

2013 ◽  
Vol 421 ◽  
pp. 449-452
Author(s):  
Xia Ma ◽  
Gao Fa He ◽  
Jian Bing Ren
Keyword(s):  
Film Thickness ◽  
Real Time ◽  
Quartz Crystal ◽  
Time Measurement ◽  
Measuring System ◽  
Coating Film ◽  
Crystal Oscillator ◽  
Real Time Measurement ◽  
Crystal Oscillation ◽  
Frequency Shifting

After the technologies of measurement for thin-film thickness were analyzed, the method of real-time measurement for coating thickness based on quartz crystal oscillation was proposed. The principle of the thickness measured by frequency shifting was analyzed on theory, the functional relationship between the resonant frequency shifting and the film thickness changing was deduced. Aim at the complicated working condition in coating machine, the structure of the measuring system for reducing the influence from external pressure and temperature was designed. The circuit for detecting the frequency shift was designed. Final, according to the experiment result, the resolution of thickness measurement can achieve sub-micrometer level.

Real-Time Measurement of Molecular Orientational Randomization Dynamics during Annealing Treatments by In-Situ Ellipsometry

2012 ◽  
Vol 116 (21) ◽  
pp. 11584-11588 ◽  
Author(s):  
Takeshi Komino ◽  
Hiroko Nomura ◽  
Masayuki Yahiro ◽  
Chihaya Adachi
Keyword(s):  
Real Time ◽  
Time Measurement ◽  
Real Time Measurement
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