Industrial high-rate (∼5 nm/s) deposited silicon nitride yielding high-quality bulk and surface passivation under optimum anti-reflection coating conditions

2005 ◽  
Vol 13 (8) ◽  
pp. 705-712 ◽  
Author(s):  
B. Hoex ◽  
A. J. M. van Erven ◽  
R. C. M. Bosch ◽  
W. T. M. Stals ◽  
M. D. Bijker ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Surface Passivation ◽  
High Rate ◽  
High Quality

High Rate Deposition of Stable Hydrogenated Amorphous Silicon in Transition from Amorphous to Microcrystalline Silicon

2003 ◽  
Vol 762 ◽  
Author(s):  
Guofu Hou ◽  
Xinhua Geng ◽  
Xiaodan Zhang ◽  
Ying Zhao ◽  
Junming Xue ◽  
...  
Keyword(s):  
Phase Transition ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
High Rate ◽  
Very High Frequency ◽  
High Quality ◽  
Working Pressure ◽  
Hydrogen Dilution ◽  
Hydrogenated Amorphous

AbstractHigh rate deposition of high quality and stable hydrogenated amorphous silicon (a-Si:H) films were performed near the threshold of amorphous to microcrystalline phase transition using a very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) method. The effect of hydrogen dilution on optic-electronic and structural properties of these films was investigated by Fourier-transform infrared (FTIR) spectroscopy, Raman scattering and constant photocurrent method (CPM). Experiment showed that although the phase transition was much influenced by hydrogen dilution, it also strongly depended on substrate temperature, working pressure and plasma power. With optimized condition high quality and high stable a-Si:H films, which exhibit σph/σd of 4.4×106 and deposition rate of 28.8Å/s, have been obtained.

Bulk passivation of multicrystalline silicon solar cells induced by high-rate-deposited (> 1 nm/s) silicon nitride films

2003 ◽  
Vol 11 (2) ◽  
pp. 125-130 ◽  
Author(s):  
J. Hong ◽  
W. M. M. Kessels ◽  
F. J. H. van Assche ◽  
H. C. Rieffe ◽  
W. J. Soppe ◽  
...  
Keyword(s):  
Solar Cells ◽  
Silicon Nitride ◽  
High Rate ◽  
Multicrystalline Silicon ◽  
Silicon Solar Cells ◽  
Silicon Nitride Films ◽  
Bulk Passivation

scholarly journals Surface Passivation of MoO3 Nanorods by Atomic Layer Deposition toward High Rate Durable Li Ion Battery Anodes

2015 ◽  
Vol 7 (24) ◽  
pp. 13154-13163 ◽  
Author(s):  
B. Ahmed ◽  
Muhammad Shahid ◽  
D. H. Nagaraju ◽  
D. H. Anjum ◽  
Mohamed N. Hedhili ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
High Rate ◽  
Li Ion Battery ◽  
Layer Deposition ◽  
Li Ion

scholarly journals High quality crystalline silicon surface passivation by combined intrinsic and n-type hydrogenated amorphous silicon

2011 ◽  
Vol 99 (20) ◽  
pp. 203503 ◽  
Author(s):  
Jan-Willem A. Schüttauf ◽  
Karine H. M. van der Werf ◽  
Inge M. Kielen ◽  
Wilfried G. J. H. M. van Sark ◽  
Jatindra K. Rath ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
High Quality ◽  
Hydrogenated Amorphous ◽  
Silicon Surface Passivation
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