Modification of clarified polypropylene by oxygen plasma to improve the adhesion of thin amorphous hydrogenated carbon films deposited by plasma enhanced chemical vapor deposition

2012 ◽  
Vol 53 (5) ◽  
pp. 1065-1072 ◽  
Author(s):  
P.H.L. Aguiar ◽  
É.C. Oliveira ◽  
S.A. Cruz
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Oxygen Plasma ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Amorphous Hydrogenated Carbon

Deposition and Etching of Amorphous Carbon Films Prepared by ECR-Plasma-Enhanced Benzene Chemical Vapor Deposition

1998 ◽  
Vol 555 ◽  
Author(s):  
Xiao-Hua Chen ◽  
Laren M. Tolbert ◽  
Z. Y. Ning ◽  
Dennis W. Hess
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Electron Cyclotron Resonance ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Benzene Vapor ◽  
Plasma Etch ◽  
Ecr Plasma ◽  
Amorphous Hydrogenated Carbon

AbstractAmorphous hydrogenated carbon thin films have been deposited from benzene vapor in a microwave electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (CVD) system. Plasma enhanced dissociation and reaction of benzene were monitored by mass spectrometry. Deposited films were characterized by Fourier transform infrared spectroscopy and fluorescence spectroscopy. The effect of the deposition rate on the film density and plasma etch resistance was also studied. The etch resistance of deposited carbon film is higher than the conventional resist Novolac.

Adherent amorphous hydrogenated carbon films on metals deposited by plasma enhanced chemical vapor deposition

2008 ◽  
Vol 516 (12) ◽  
pp. 4011-4017 ◽  
Author(s):  
G. Capote ◽  
L.F. Bonetti ◽  
L.V. Santos ◽  
V.J. Trava-Airoldi ◽  
E.J. Corat
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Amorphous Hydrogenated Carbon
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