scholarly journals Oxygen Plasma Etching of Carbon Films Unintentionally Deposited on Chamber Walls in Magneto-Active Microwave Chemical Vapor Deposition System.

Shinku ◽  
1999 ◽  
Vol 42 (3) ◽  
pp. 217-220
Author(s):  
Hyeongmin JEON ◽  
Akimitsu HATTA ◽  
Toshimichi ITO
RSC Advances ◽  
2016 ◽  
Vol 6 (51) ◽  
pp. 45884-45893 ◽  
Author(s):  
Sohyun Park ◽  
Jooyoun Kim ◽  
Chung Hee Park

A super-repellent fabric was fabricated using oxygen plasma etching and plasma enhanced chemical vapor deposition and the influence of dual roughness on wettability in micro and nano-scale structures was analysed.


2010 ◽  
Vol 42 (12-13) ◽  
pp. 1702-1705 ◽  
Author(s):  
R. Maheswaran ◽  
R. Sivaraman ◽  
O. Mahapatra ◽  
P. C. Rao ◽  
C. Gopalakrishnan ◽  
...  

2013 ◽  
Vol 52 (11R) ◽  
pp. 110123 ◽  
Author(s):  
Meng Yang ◽  
Susumu Takabayashi ◽  
Shuichi Ogawa ◽  
Hiroyuki Hayashi ◽  
Radek Ješko ◽  
...  

2012 ◽  
Vol 523 ◽  
pp. 25-28 ◽  
Author(s):  
Meng Yang ◽  
Shuichi Ogawa ◽  
Susumu Takabayashi ◽  
Taiichi Otsuji ◽  
Yuji Takakuwa

2009 ◽  
Vol 517 (19) ◽  
pp. 5739-5742 ◽  
Author(s):  
F.R. Marciano ◽  
L.F. Bonetti ◽  
R.S. Pessoa ◽  
M. Massi ◽  
L.V. Santos ◽  
...  

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