Oxygen Plasma Etching of Carbon Films Unintentionally Deposited on Chamber Walls in Magneto-Active Microwave Chemical Vapor Deposition System.
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2017 ◽
Vol 17
(7)
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pp. 4907-4913
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2012 ◽
Vol 53
(5)
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pp. 1065-1072
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High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2006 ◽
Vol 10
(3)
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pp. 457-466
2010 ◽
Vol 42
(12-13)
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pp. 1702-1705
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2013 ◽
Vol 52
(11R)
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pp. 110123
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2021 ◽
Vol 39
(4)
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pp. 042203
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