Effects of the growth conditions on the roughness of amorphous hydrogenated carbon films deposited by plasma enhanced chemical vapor deposition

2006 ◽  
Vol 24 (6) ◽  
pp. 2212-2216 ◽  
Author(s):  
G. Capote ◽  
R. Prioli ◽  
F. L. Freire
1998 ◽  
Vol 555 ◽  
Author(s):  
Xiao-Hua Chen ◽  
Laren M. Tolbert ◽  
Z. Y. Ning ◽  
Dennis W. Hess

AbstractAmorphous hydrogenated carbon thin films have been deposited from benzene vapor in a microwave electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (CVD) system. Plasma enhanced dissociation and reaction of benzene were monitored by mass spectrometry. Deposited films were characterized by Fourier transform infrared spectroscopy and fluorescence spectroscopy. The effect of the deposition rate on the film density and plasma etch resistance was also studied. The etch resistance of deposited carbon film is higher than the conventional resist Novolac.


2008 ◽  
Vol 516 (12) ◽  
pp. 4011-4017 ◽  
Author(s):  
G. Capote ◽  
L.F. Bonetti ◽  
L.V. Santos ◽  
V.J. Trava-Airoldi ◽  
E.J. Corat

2010 ◽  
Vol 42 (12-13) ◽  
pp. 1702-1705 ◽  
Author(s):  
R. Maheswaran ◽  
R. Sivaraman ◽  
O. Mahapatra ◽  
P. C. Rao ◽  
C. Gopalakrishnan ◽  
...  

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