EUV Sources for Lithography
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HEIGHTS-EUV Package for DPP Source Modeling

2010 ◽  
pp. 277-298 ◽  
Author(s):  
A. Hassanein ◽  
V. Morozov ◽  
V. Sizyuk ◽  
V. Tolkach ◽  
B. Rice
Keyword(s):  
Source Modeling

Fundamentals and Limits of Plasma-Based EUV Sources

2010 ◽  
pp. 197-222 ◽  
Author(s):  
Rainer Lebert ◽  
Thomas Krücken ◽  
H. Kunze

Laser Plasma EUV Sources Based on Droplet Target Technology

2010 ◽  
pp. 687-718 ◽  
Author(s):  
Martin Richardson ◽  
Chiew-Seng Koay ◽  
Kazutoshi Takenoshita ◽  
Christian Keyser ◽  
Simi George ◽  
...  
Keyword(s):  
Laser Plasma

Xenon and Tin Pinch Discharge Sources

2010 ◽  
pp. 477-504 ◽  
Author(s):  
Vladimir Borisov ◽  
Andrey Demin ◽  
Alexander Eltsov ◽  
Alexander Ivanov ◽  
Yuriy Kiryukhin ◽  
...  

Star Pinch EUV Source

2010 ◽  
pp. 453-475 ◽  
Author(s):  
Malcolm McGeoch

High-Power GDPP Z-Pinch EUV Source Technology

2010 ◽  
pp. 413-452 ◽  
Author(s):  
Uwe Stamm ◽  
Guido Schriever ◽  
Jürgen Kleinschmidt
Keyword(s):  
High Power ◽  
Z Pinch

scholarly journals Potential Energy Sputtering of EUVL Materials

2010 ◽  
pp. 1033-1044
Author(s):  
Joshua Pomeroy ◽  
Laura Ratliff ◽  
John Gillaspy ◽  
Saša Bajt
Keyword(s):  
Potential Energy

Xenon Target and High-Power Laser Module Development for LPP Sources

2010 ◽  
pp. 669-686
Author(s):  
Richard Moyer ◽  
Harry Shields ◽  
Steven Fornaca ◽  
Randall St. Pierre ◽  
Armando Martos ◽  
...  
Keyword(s):  
High Power ◽  
High Power Laser ◽  
Power Laser ◽  
Laser Module ◽  
Module Development
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