High-Power GDPP Z-Pinch EUV Source Technology

2010 ◽  
pp. 413-452 ◽  
Author(s):  
Uwe Stamm ◽  
Guido Schriever ◽  
Jürgen Kleinschmidt
Keyword(s):  
High Power ◽  
Z Pinch

Formation of tight plasma pinches and generation of high-power soft x-ray radiation pulses in fast Z-pinch implosions

Laser Physics ◽  
2006 ◽  
Vol 16 (1) ◽  
pp. 183-193 ◽  
Author(s):  
A. V. Shishlov ◽  
R. B. Baksht ◽  
S. A. Chaikovsky ◽  
A. V. Fedunin ◽  
F. I. Fursov ◽  
...  
Keyword(s):  
High Power ◽  
X Ray ◽  
Z Pinch

Characterization of axially directed x rays generated from a target within a high-power z-pinch (abstract)

2001 ◽  
Vol 72 (1) ◽  
pp. 1217-1217 ◽  
Author(s):  
T. W. L. Sanford ◽  
J. E. Bailey ◽  
G. A. Chandler ◽  
M. E. Cuneo ◽  
D. L. Fehl ◽  
...  
Keyword(s):  
High Power ◽  
X Rays ◽  
Z Pinch

scholarly journals Time-dependent electron temperature diagnostics for high-power, aluminum z-pinch plasmas

1997 ◽  
Vol 68 (1) ◽  
pp. 852-857 ◽  
Author(s):  
T. W. L. Sanford ◽  
T. J. Nash ◽  
R. C. Mock ◽  
R. B. Spielman ◽  
J. F. Seamen ◽  
...  
Keyword(s):  
Electron Temperature ◽  
High Power ◽  
Time Dependent ◽  
Temperature Diagnostics ◽  
Z Pinch

Dynamics of a high-power aluminum-wire array Z-pinch implosion

1997 ◽  
Vol 4 (6) ◽  
pp. 2188-2203 ◽  
Author(s):  
T. W. L. Sanford ◽  
T. J. Nash ◽  
R. C. Mock ◽  
R. B. Spielman ◽  
K. W. Struve ◽  
...  
Keyword(s):  
High Power ◽  
Wire Array ◽  
Aluminum Wire ◽  
Z Pinch

scholarly journals Variation of high-power aluminum-wire array Z-pinch dynamics with wire number, load mass, and array radius

1997 ◽  
Author(s):  
T. W. L. Sanford ◽  
R. C. Mock ◽  
B. M. Marder ◽  
T. J. Nash ◽  
R. B. Spielman ◽  
...  
Keyword(s):  
High Power ◽  
Wire Array ◽  
Aluminum Wire ◽  
Z Pinch ◽  
Load Mass

HIGH-POWER EUV SOURCE FOR LITHOGRAPHY USING A TIN TARGET

2006 ◽  
Vol 05 (06) ◽  
pp. 677-682 ◽  
Author(s):  
C. H. ZHANG ◽  
S. KATSUKI ◽  
A. KIMURA ◽  
H. HORITA ◽  
T. NAMIHIRA ◽  
...  
Keyword(s):  
Conversion Efficiency ◽  
High Power ◽  
Extreme Ultraviolet ◽  
Capillary Discharge ◽  
High Conversion Efficiency ◽  
Euv Emission ◽  
Pinhole Imaging ◽  
Background Gas ◽  
Next Generation Lithography ◽  
Z Pinch

Xenon capillary discharge sources are being developed for extreme ultraviolet (EUV) light for next generation lithography. However, the current sources generate in-band (2%), 2π EUV emission with conversion efficiency (CE) of <1%. Here we report progress in the development of a Z-pinch EUV source using a tin target, which was found to have significant potential for high conversion efficiency with wavelength of 13.5 nm. Xenon was used as the background gas, the experiments show that the magnitude of the EUV emission depended on not only the distance between the plasma and the rod surface, but also the pulse repetition rate of the discharge. Pinhole imaging, an EUV spectrograph and an in-band EUV energy monitor were used to characterize the EUV emission from the Z-pinch discharge.

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