Advanced Etch Technology for Nanopatterning VIII
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Published By SPIE

9781510625730, 9781510625747

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Front Matter: 10963

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2533873 ◽

2019 ◽

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Line roughness improvements on EUV 36nm pitch pattern by plasma treatment method

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2514764 ◽

2019 ◽

Author(s):

Toshiharu Wada ◽

Chia-Yun Hsieh ◽

Akiteru Ko ◽

Peter Biolsi

Keyword(s):

Plasma Treatment ◽

Treatment Method ◽

Pitch Pattern

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Integrated self-aligned quadruple patterning flow for sub-7nm application

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2515076 ◽

2019 ◽

Author(s):

Eric Liu ◽

Sophie Thibaut ◽

Akiteru Ko ◽

Peter Biolsi

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Virtual fabrication and advanced process control improve yield for SAQP process assessment with 16 nm half-pitch

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2518099 ◽

2019 ◽

Author(s):

Benjamin Vincent ◽

Stephane Lariviere ◽

Chris Wilson ◽

Ryan Kim ◽

Joseph Ervin

Keyword(s):

Process Control ◽

Process Assessment ◽

Advanced Process Control

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Etch aware computational patterning in the era of atomic precision processing

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2513211 ◽

2019 ◽

Author(s):

Peter Ventzek ◽

Alok Ranjan ◽

Jun Shinagawa

Keyword(s):

Atomic Precision

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Ultrahigh selective etching of Si3N4 over SiO2 using plasma-less dry process for 3D-NAND device applications

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2504426 ◽

2019 ◽

Author(s):

Chih-Yu Hsu ◽

Peng Shen ◽

Nathan Stafford

Keyword(s):

Selective Etching ◽

Dry Process ◽

Device Applications

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Fabrication challenges and opportunities for high-mobility materials: from CMOS applications to emerging derivative technologies

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2511746 ◽

2019 ◽

Author(s):

Nadine Collaert ◽

Alireza Alian ◽

Brice De Jaeger ◽

Uthayasankararan Peralagu ◽

Abhitosh Vais ◽

...

Keyword(s):

High Mobility ◽

Challenges And Opportunities

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Simulation and optimization of etch on flexible substrates for roll-to-roll processing

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2515104 ◽

2019 ◽

Author(s):

Sofia Helpert ◽

Yang Ban ◽

Meghali Chopra ◽

Roger Bonnecaze

Keyword(s):

Flexible Substrates ◽

Simulation And Optimization ◽

Roll To Roll

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EUV line-space pattern defect mitigation simulation using Coventor SEMulator3D to enable exposure dose reduction

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2518553 ◽

2019 ◽

Author(s):

Daniel Sobieski ◽

Rich Wise ◽

Yang Pan ◽

David Fried ◽

Jengyi Yu ◽

...

Keyword(s):

Dose Reduction ◽

Exposure Dose ◽

Space Pattern ◽

Line Space

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Across-wafer sub-1 nm critical dimension uniformity control by etch tool correction

Advanced Etch Technology for Nanopatterning VIII ◽

10.1117/12.2519383 ◽

2019 ◽

Cited By ~ 1

Author(s):

Changwoo Lee

Keyword(s):

Critical Dimension ◽

Tool Correction

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Advanced Etch Technology for Nanopatterning VIIILatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By SPIE

Front Matter: 10963

Line roughness improvements on EUV 36nm pitch pattern by plasma treatment method

Integrated self-aligned quadruple patterning flow for sub-7nm application

Virtual fabrication and advanced process control improve yield for SAQP process assessment with 16 nm half-pitch

Etch aware computational patterning in the era of atomic precision processing

Ultrahigh selective etching of Si3N4 over SiO2 using plasma-less dry process for 3D-NAND device applications

Fabrication challenges and opportunities for high-mobility materials: from CMOS applications to emerging derivative technologies

Simulation and optimization of etch on flexible substrates for roll-to-roll processing

EUV line-space pattern defect mitigation simulation using Coventor SEMulator3D to enable exposure dose reduction

Across-wafer sub-1 nm critical dimension uniformity control by etch tool correction

Advanced Etch Technology for Nanopatterning VIII
Latest Publications