ex situ xrd
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ChemInform ◽  
2013 ◽  
Vol 44 (51) ◽  
pp. no-no
Author(s):  
Jianhong Liu ◽  
Yanan Li ◽  
Xingqin Wang ◽  
Yun Gao ◽  
Ningning Wu ◽  
...  

2013 ◽  
Vol 581 ◽  
pp. 236-240 ◽  
Author(s):  
Jianhong Liu ◽  
Yanan Li ◽  
Xingqin Wang ◽  
Yun Gao ◽  
Ningning Wu ◽  
...  

2013 ◽  
Vol 1580 ◽  
Author(s):  
A. Le Priol ◽  
E. Le Bourhis ◽  
P.-O. Renault ◽  
L. Simonot ◽  
G. Abadias ◽  
...  

ABSTRACTRefractory metal alloy WTi films were elaborated by magnetron sputtering from an alloyed target (W:Ti ∼ 70:30 at%). Film continuity threshold has been determined at 4.5 ± 0.2 nm using in situ surface differential reflectance (SDR) technique. Prior to film continuity, deposition of a continuous interfacial layer is suggested by both in situ and real-time SDR and wafer-curvature techniques. After continuity, WxTi1-x films (9.5 nm thick WTi films) have a body-centered structure with a {110} fiber texture. Composition (x) and microstructure can be tuned varying working pressure. A transition from compressive to tensile residual stresses was observed by ex situ XRD and wafer-curvature methods. Size dependent resistivity is obtained and slightly varies as a function of working pressure.


2012 ◽  
Vol 24 (13) ◽  
pp. 2462-2471 ◽  
Author(s):  
Mohamed Haouas ◽  
Christophe Volkringer ◽  
Thierry Loiseau ◽  
Gérard Férey ◽  
Francis Taulelle

2006 ◽  
Vol 352 (38-39) ◽  
pp. 4101-4111 ◽  
Author(s):  
T. Fuss ◽  
A. Moguš-Milanković ◽  
C.S. Ray ◽  
C.E. Lesher ◽  
R. Youngman ◽  
...  

2005 ◽  
Vol 50 (20) ◽  
pp. 4104-4108 ◽  
Author(s):  
H.M. Wu ◽  
J.P. Tu ◽  
Y.F. Yuan ◽  
Y. Li ◽  
X.B. Zhao ◽  
...  

2004 ◽  
Vol 49 (20) ◽  
pp. 3305-3311 ◽  
Author(s):  
Lianqi Zhang ◽  
Xiaoqing Wang ◽  
Hideyuki Noguchi ◽  
Masaki Yoshio ◽  
Kazunori Takada ◽  
...  
Keyword(s):  
Ex Situ ◽  

2003 ◽  
Vol 542 ◽  
pp. 1-6 ◽  
Author(s):  
Jian Xie ◽  
Xinbing Zhao ◽  
Gaoshao Cao ◽  
Yaodong Zhong ◽  
Mingjian Zhao

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