capacitive microaccelerometer
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2015 ◽  
Vol 23 (12) ◽  
pp. 3350-3356
Author(s):  
储宜兴 CHU Yi-xing ◽  
池保勇 CHI Bao-yong ◽  
刘云峰 LIU Yun-feng ◽  
董景新 DONG Jing-xin

2011 ◽  
Vol 317-319 ◽  
pp. 1843-1846
Author(s):  
Yun Kui Zhang ◽  
Feng Cui ◽  
Zhen Wan ◽  
Kai Li ◽  
Wu Liu ◽  
...  

In this paper, differential capacitors sandwiched structure of a high-G capacitive microaccelerometer with round metal proof mass supported by multi-beam and its characteristic are presented. The operation principle and built-in self-calibration and self-test functions are described. The fabrication process and the fabricated chip of the microaccelerometer based on UV-LIGA technology are reported. The detection and closed-loop control circuits of the microaccelerometer are designed and calibrated. The range of the detection channel is ±6pF, the sensitivity is 89.3mV/pF, and the linearity is 2.59%.


2011 ◽  
Vol 483 ◽  
pp. 148-153
Author(s):  
Yu Liu ◽  
Zhi Yu Wen ◽  
Li Chen ◽  
Xue Feng He ◽  
Sheng Qiang Wang

This work focuses on the development of a biaxial fully differential capacitive microaccelerometer with a single proof-mass. Its design, optimization and fabrication are discussed in detail. Structure and geometric parameters are optimized by multidisciplinary design optimization, enabling ±1g operating range, 1182Hz resonant frequency, 97 fF/g sensitivity, 4.1mg resolution and 0.68 damping ratio. Silicon-on-glass (SOG) bulk micromachining and inductively coupled plasma (ICP) etching technologies are adopted to fabricate this accelerometer.


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