A High–G Metal Capacitive Microaccelerometer with Round Proof Mass Supported by Multi-Beam

In this paper, differential capacitors sandwiched structure of a high-G capacitive microaccelerometer with round metal proof mass supported by multi-beam and its characteristic are presented. The operation principle and built-in self-calibration and self-test functions are described. The fabrication process and the fabricated chip of the microaccelerometer based on UV-LIGA technology are reported. The detection and closed-loop control circuits of the microaccelerometer are designed and calibrated. The range of the detection channel is ±6pF, the sensitivity is 89.3mV/pF, and the linearity is 2.59%.

A Biaxial Capacitive Microaccelerometer with a Single Proof-Mass

This work focuses on the development of a biaxial fully differential capacitive microaccelerometer with a single proof-mass. Its design, optimization and fabrication are discussed in detail. Structure and geometric parameters are optimized by multidisciplinary design optimization, enabling ±1g operating range, 1182Hz resonant frequency, 97 fF/g sensitivity, 4.1mg resolution and 0.68 damping ratio. Silicon-on-glass (SOG) bulk micromachining and inductively coupled plasma (ICP) etching technologies are adopted to fabricate this accelerometer.