Scanning Electron Beam Instrument for Photo Resist Exposure

With the recent commercial introduction of the scanning electron microscope there has been considerable interest in the possibility of modifying this instrument for the exposure of photo resists in producing integrated circuits for the electronics industry. These modifications include beam blanking and scan programming. Because not all of the requirements of this type apparatus are consistent with the best design of a scanning electron microscope, JEOL has designed and is now introducing an instrument intended specifically for this purpose, the JEBX-2B.

A Simplified Electron Beam Gun for Producing Evaporated Films in Electron Microscopy

The use of an electron beam as the source of heat for the vacuum evaporation of materials has increased rapidly in the past few years. Some of the advantages of electron beam over resistance heating are; 1) it can be easily controlled and manipulated. However, even with these significant advantages it has not found extensive application in most electron microscopy laboratories. The main reason for its limited use is that the commercial instruments available are for heavy production work; as a result they are overdesigned for this purpose. The object of this study was to design an electron beam instrument specifically for this field. This would require the instrument to be: 1) easily constructed using readily available commercial parts, 2) nominal in cost and 3) uncomplicated to operate.The initial phase of this study was concerned with the electron gun design. A television picture tube gun was chosen because it produces a fine beam of electrons, it has incorporated into its design all of the elements necessary for critical control of the electron beam and it is readily available.