The Electron Beam Instrument (F6) on Freja

1994 ◽  
Vol 70 (3-4) ◽  
pp. 447-463 ◽  
Author(s):  
G. Paschmann ◽  
M. Boehm ◽  
H. H�fner ◽  
R. Frenzel ◽  
P. Parigger ◽  
...  
Keyword(s):  
Electron Beam ◽  
Beam Instrument ◽  
Electron Beam Instrument

The Electron Beam Instrument (F6) on Freja

1994 ◽  
pp. 43-59
Author(s):  
G. Paschmann ◽  
M. Boehm ◽  
H. Höfner ◽  
R. Frenzel ◽  
P. Parigger ◽  
...  
Keyword(s):  
Electron Beam ◽  
Beam Instrument ◽  
Electron Beam Instrument

Scanning Electron Beam Instrument for Photo Resist Exposure

1969 ◽  
Vol 27 ◽  
pp. 150-151
Author(s):  
S. Miyauchi ◽  
K. Tanaka ◽  
J. C. Russ
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Integrated Circuits ◽  
Electronics Industry ◽  
Commercial Introduction ◽  
Scanning Electron ◽  
Type Apparatus ◽  
Beam Instrument ◽  
Electron Beam Instrument

With the recent commercial introduction of the scanning electron microscope there has been considerable interest in the possibility of modifying this instrument for the exposure of photo resists in producing integrated circuits for the electronics industry. These modifications include beam blanking and scan programming. Because not all of the requirements of this type apparatus are consistent with the best design of a scanning electron microscope, JEOL has designed and is now introducing an instrument intended specifically for this purpose, the JEBX-2B.

A Simplified Electron Beam Gun for Producing Evaporated Films in Electron Microscopy

1968 ◽  
Vol 26 ◽  
pp. 296-297
Author(s):  
R. F. Schneidniller ◽  
J. H. Richardson
Keyword(s):  
Electron Microscopy ◽  
Electron Beam ◽  
Initial Phase ◽  
Vacuum Evaporation ◽  
Electron Gun ◽  
Resistance Heating ◽  
The Past ◽  
Beam Instrument ◽  
Electron Beam Instrument

The use of an electron beam as the source of heat for the vacuum evaporation of materials has increased rapidly in the past few years. Some of the advantages of electron beam over resistance heating are; 1) it can be easily controlled and manipulated. However, even with these significant advantages it has not found extensive application in most electron microscopy laboratories. The main reason for its limited use is that the commercial instruments available are for heavy production work; as a result they are overdesigned for this purpose. The object of this study was to design an electron beam instrument specifically for this field. This would require the instrument to be: 1) easily constructed using readily available commercial parts, 2) nominal in cost and 3) uncomplicated to operate.The initial phase of this study was concerned with the electron gun design. A television picture tube gun was chosen because it produces a fine beam of electrons, it has incorporated into its design all of the elements necessary for critical control of the electron beam and it is readily available.

scholarly journals Diffusion Pumps and Water Chillers

2001 ◽  
Vol 9 (3) ◽  
pp. 28-29
Author(s):  
F.C. Thomas
Keyword(s):  
Electron Beam ◽  
Ion Pumps ◽  
Tungsten Filaments ◽  
Copper Tubing ◽  
Vacuum Systems ◽  
Beam Instrument

This note concerns two very important parts of most beam instrument systems; diffusion pumps and water chillers. As we'll see below, the two can be intimately connected.Many SEMs, TEMs and other electron beam instruments contain one or more diffusion pumps as part of their vacuum systems. These are usually vertically-oriented cylindrical objects, perhaps 30 cm high, wrapped in several turns of copper tubing. They are usually placed behind or below the instrument's column, and typically handle high vacuums for tungsten filaments, or backing for ion pumps with other emitter types. Generally, these units are fairly maintenance-free; a change of oil every few years may be all that is required.

scholarly journals A ‘Different’ Kind of Microscopy

2007 ◽  
Vol 15 (1) ◽  
pp. 6-13
Author(s):  
Fred Schamber ◽  
Kai van Beek
Keyword(s):  
Electron Beam ◽  
Automated Analysis ◽  
X Ray ◽  
Microscope Images ◽  
Image Analyzers ◽  
Tone Of Voice ◽  
Electron Microscopes ◽  
Scanning Electron Microscopes ◽  
Scanning Electron ◽  
Beam Instrument

At the August M&M-2006 meeting in Chicago, we were standing next to our poster titled A Different Kind of Microscopy: Analyzing Features with an Automated Electron Beam when an acquaintance with long experience in electron microscopy wandered by. After a glance at the poster title, he challenged: “What's different about that?” Upon hearing our summary he asked (with what we took to be an encouraging tone of voice): “Are you going to publish this?” We had enough similar reactions from others to make that seem a good idea, and this is the result.This discussion should begin by noting that the operative word in the title is “different,” not “new.” In point of fact, the foundations for the technique were laid in the 1970s when some workers began putting scanning electron microscopes and microprobes under software control by interfacing them to the “minicomputers” that powered the computerized x-ray analyzer units then entering the market. Even prior to this, there were a few “hard-wired” image analyzers that mechanized the process of extracting information from microscope images. Thus, automated analysis of features via an electron beam instrument is hardly a new concept.

Techniques for Transmission Electron Microscopy of Fiber-Matrix Interfaces in Aluminum Alloy-Boron Composites by Ion Erosio

1971 ◽  
Vol 29 ◽  
pp. 204-205
Author(s):  
G. G. Shaw
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Aluminum Alloy ◽  
Electron Beam ◽  
Pure Aluminum ◽  
Ion Milling ◽  
Transmission Electron ◽  
Fiber Matrix ◽  
Ion Erosion ◽  
Row Of Fibers

The morphology and composition of the fiber-matrix interface can best be studied by transmission electron microscopy and electron diffraction. For some composites satisfactory samples can be prepared by electropolishing. For others such as aluminum alloy-boron composites ion erosion is necessary.When one wishes to examine a specimen with the electron beam perpendicular to the fiber, preparation is as follows: A 1/8 in. disk is cut from the sample with a cylindrical tool by spark machining. Thin slices, 5 mils thick, containing one row of fibers, are then, spark-machined from the disk. After spark machining, the slice is carefully polished with diamond paste until the row of fibers is exposed on each side, as shown in Figure 1.In the case where examination is desired with the electron beam parallel to the fiber, preparation is as follows: Experimental composites are usually 50 mils or less in thickness so an auxiliary holder is necessary during ion milling and for easy transfer to the electron microscope. This holder is pure aluminum sheet, 3 mils thick.

Temperature Dependence of the Critical Electron Dose for Fatty Acid Monolayers

1982 ◽  
Vol 40 ◽  
pp. 78-79
Author(s):  
Kenneth H. Downing ◽  
Robert M. Glaeser
Keyword(s):  
Electron Beam ◽  
Fatty Acid ◽  
Inelastic Scattering ◽  
Temperature Dependence ◽  
Structural Damage ◽  
Direct Result ◽  
Second Step ◽  
Strong Temperature Dependence ◽  
Electron Dose ◽  
Covalent Bonds

The structural damage of molecules irradiated by electrons is generally considered to occur in two steps. The direct result of inelastic scattering events is the disruption of covalent bonds. Following changes in bond structure, movement of the constituent atoms produces permanent distortions of the molecules. Since at least the second step should show a strong temperature dependence, it was to be expected that cooling a specimen should extend its lifetime in the electron beam. This result has been found in a large number of experiments, but the degree to which cooling the specimen enhances its resistance to radiation damage has been found to vary widely with specimen types.

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Domain Formation in Synthetic Quartz

1971 ◽  
Vol 29 ◽  
pp. 156-157
Author(s):  
Joseph J. Comer
Keyword(s):  
Electron Beam ◽  
Room Temperature ◽  
Domain Formation ◽  
Synthetic Quartz ◽  
Transmission Electron ◽  
Black Spots ◽  
Diffraction Mode ◽  
Domain Boundaries ◽  
Kikuchi Lines ◽  
Straight Lines

Domains visible by transmission electron microscopy, believed to be Dauphiné inversion twins, were found in some specimens of synthetic quartz heated to 680°C and cooled to room temperature. With the electron beam close to parallel to the [0001] direction the domain boundaries appeared as straight lines normal to <100> and <410> or <510> directions. In the selected area diffraction mode, a shift of the Kikuchi lines was observed when the electron beam was made to traverse the specimen across a boundary. This shift indicates a change in orientation which accounts for the visibility of the domain by diffraction contrast when the specimen is tilted. Upon exposure to a 100 KV electron beam with a flux of 5x 1018 electrons/cm2sec the boundaries are rapidly decorated by radiation damage centers appearing as black spots. Similar crystallographio boundaries were sometimes found in unannealed (0001) quartz damaged by electrons.

Materials for Electron Beam Information Storage

1969 ◽  
Vol 27 ◽  
pp. 152-153 ◽  
Author(s):  
D. E. Speliotis
Keyword(s):  
Magnetic Field ◽  
Electron Beam ◽  
Recent Literature ◽  
Electron Beams ◽  
Information Storage ◽  
The Subject ◽  
The Magnetic Field

The interaction of electron beams with a large variety of materials for information storage has been the subject of numerous proposals and studies in the recent literature. The materials range from photographic to thermoplastic and magnetic, and the interactions with the electron beam for writing and reading the information utilize the energy, or the current, or even the magnetic field associated with the electron beam.

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