Characteristics Comparison of Neon, Argon, and Krypton Ion Emissions from Gas Field Ionization Sources with a Single-Atom Tip

A scanning ion beam instrument equipped with a gas field ionization source (GFIS) has been commercialized, but only helium and neon are currently available as GFISs. In this study, the characteristics of neon, argon, and krypton ion emissions from a single-atom tip are compared, specifically for faster fabrication by milling of a silicon sample. Although the boiling point of argon is about 87 K, our experiments on characterizing argon ion emission can be carried out at temperatures of about 50 K at an argon gas pressure lower than 0.1 Pa. Argon exhibits ion current characteristics, as a function of tip voltage, between those of neon and krypton. The value obtained by multiplying the ion emission current by the sputtering yield is suitable for a figure of merit (FOM) for faster fabrication. The FOM for argon is the highest among the three ion species. This value must be extensively evaluated from the viewpoint of practical nano-fabrication application. The instabilities of neon, argon, and krypton ion currents (3σ) become as low as 8% in 1 h, which is sufficient for fabrication applications. We conclude that an argon or krypton GFIS ion beam instrument will be a useful tool for nano-fabrication.

A Comprehensive Approach Towards Optimizing the Xenon Plasma Focused Ion Beam Instrument for Semiconductor Failure Analysis Applications

The xenon plasma focused ion beam instrument (PFIB), holds significant promise in expanding the applications of focused ion beams in new technology thrust areas. In this paper, we have explored the operational characteristics of a Tescan FERA3 XMH PFIB instrument with the aim of meeting current and future challenges in the semiconductor industry. A two part approach, with the first part aimed at optimizing the ion column and the second optimizing specimen preparation, has been undertaken. Detailed studies characterizing the ion column, optimizing for high-current/high mill rate activities, have been described to support a better understanding of the PFIB. In addition, a novel single-crystal sacrificial mask method has been developed and implemented for use in the PFIB. Using this combined approach, we have achieved high-quality images with minimal artifacts, while retaining the shorter throughput times of the PFIB. Although the work presented in this paper has been performed on a specific instrument, the authors hope that these studies will provide general insight to direct further improvement of PFIB design and applications.

Evaluation of TEM-Lamella Oxidation

This study investigated the origin of detrimental high ohmic behavior of contacts by means of analytical electron microscopy. The root cause for the high resistivity could be identified as delamination of the contact bottom in the nanometer range. Based on the results, we were able to establish a method to identify thin oxide layers using analytical methods without being able to spatially resolve them in a combined focused ion beam instrument and scanning electron microscope.

Fabricating Nanofluidic Channels and Applying them for DNA Molecules Study

In the emerging field of nanobiotechnology, further downsizing the fluidic channels and pores to the nanometer scale are attractive for both fundamental studies and technical applications. The insulation Silicon nitride membrane nanofluidic channel arrays which have width ~50nm and depth ~80nm and length ≥20μm were created by focused-ion-beam instrument. The λ-DNA molecules were put inside nanochannels and transferred, a fluorescence microscopy was used to observe the images. Only by capillary force, λ-DNA molecules moved inside the nanochannels which dealt with activating reagent Brij aqueous solution. These scope nanostructure devices will help us study DNA transporting through a nanopore and understand more DNA dynamics characteristics.