lithography step
Recently Published Documents

TOTAL DOCUMENTS

16
(FIVE YEARS 1)

H-INDEX

6
(FIVE YEARS 0)
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Self-aligned sequential lateral field non-uniformities over channel depth for high throughput dielectrophoretic cell deflection

Lab on a Chip ◽  
2021 ◽  
Author(s):  
XuHai Huang ◽  
Karina Torres-Castro ◽  
Walter Varhue ◽  
Armita Salahi ◽  
Ahmed Rasin ◽  
...  
Keyword(s):  
High Throughput ◽  
Channel Depth ◽  
Lateral Field ◽  
Lithography Step

Self-aligned sequential lateral field non-uniformities extending uniformly over the sample channel depth are fabricated using a single lithography step for enabling phenotype-specific dielectrophoretic separation of cells.

High-Power 10-Channel WDM Laser Array Fabricated with a Holographic Lithography Step

2019 ◽  
Author(s):  
Po Dong ◽  
Kwangwoong Kim ◽  
A. Melikyan ◽  
Guan-Lin Su ◽  
J.-E. Tremblay ◽  
...  
Keyword(s):  
High Power ◽  
Holographic Lithography ◽  
Laser Array ◽  
Lithography Step

Multi-electrode tunable liquid crystal lenses with one lithography step

2018 ◽  
Vol 43 (2) ◽  
pp. 271 ◽  
Author(s):  
Jeroen Beeckman ◽  
Tzu-Hsuan Yang ◽  
Inge Nys ◽  
John Puthenparampil George ◽  
Tsung-Hsien Lin ◽  
...  
Keyword(s):  
Liquid Crystal ◽  
Lithography Step

scholarly journals Single lithography-step self-aligned fabrication process for Vertical-Cavity Surface-Emitting Lasers

2017 ◽  
Vol 61 ◽  
pp. 35-38 ◽  
Author(s):  
Ludovic Marigo-Lombart ◽  
Alexandre Arnoult ◽  
Laurent Mazenq ◽  
Pascal Dubreuil ◽  
Benjamin Reig ◽  
...  
Keyword(s):  
Fabrication Process ◽  
Cavity Surface ◽  
Surface Emitting Lasers ◽  
Vertical Cavity Surface ◽  
Lithography Step ◽  
Emitting Lasers ◽  
Vertical Cavity

Fabrication of double recess structure by single lithography step using silicon-nitride-assisted process in pseudomorphic HEMTs

2014 ◽  
Vol 127 ◽  
pp. 61-67
Author(s):  
K. Mahadeva Bhat ◽  
Saptarshi Pathak ◽  
G. Sai Saravanan ◽  
Ch. Sridhar ◽  
S. Bhaskar ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Lithography Step

Transistors Formed from a Single Lithography Step Using Information Encoded in Topography

Small ◽  
2010 ◽  
Vol 6 (18) ◽  
pp. 2050-2057 ◽  
Author(s):  
Michael D. Dickey ◽  
Kasey J. Russell ◽  
Darren J. Lipomi ◽  
Venkatesh Narayanamurti ◽  
George M. Whitesides
Keyword(s):  
Lithography Step

Self-Aligned Memristor Cross-Point Arrays Fabricated with One Nanoimprint Lithography Step

Nano Letters ◽  
2010 ◽  
Vol 10 (8) ◽  
pp. 2909-2914 ◽  
Author(s):  
Qiangfei Xia ◽  
J. Joshua Yang ◽  
Wei Wu ◽  
Xuema Li ◽  
R. Stanley Williams
Keyword(s):  
Nanoimprint Lithography ◽  
Cross Point ◽  
Lithography Step

scholarly journals Contacting individual Fe(110) dots in a single electron-beam lithography step

2009 ◽  
Vol 20 (28) ◽  
pp. 285302 ◽  
Author(s):  
F Cheynis ◽  
H Haas ◽  
T Fournier ◽  
L Ranno ◽  
W Wernsdorfer ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Single Electron ◽  
Lithography Step
Load More ...
Sign in / Sign up

Export Citation Format

Share Document