holographic lithography
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2021 ◽  
Vol 46 (19) ◽  
pp. 4781
Author(s):  
Yi-Fan Wang ◽  
Yue-Feng Liu ◽  
Nai-Rong Jiang ◽  
Han-Wen Zhang ◽  
Shi-Rong Wang ◽  
...  

2021 ◽  
Vol 7 (1) ◽  
Author(s):  
Gaopeng Xue ◽  
Qihang Zhai ◽  
Haiou Lu ◽  
Qian Zhou ◽  
Kai Ni ◽  
...  

AbstractPeriodic microscale array structures play an important role in diverse applications involving photonic crystals and diffraction gratings. A polarized holographic lithography system is proposed for patterning high-uniformity microscale two-dimensional crossed-grating structures with periodic tunability. Orthogonal two-axis Lloyd’s mirror interference and polarization modulation produce three sub-beams, enabling the formation of two-dimensional crossed-grating patterns with wavelength-comparable periods by a single exposure. The two-dimensional-pattern period can also be flexibly tuned by adjusting the interferometer spatial positioning. Polarization states of three sub-beams, defining the uniformity of the interference fringes, are modulated at their initial-polarization states based on a strict full polarization tracing model in a three-dimensional space. A polarization modulation model is established considering two conditions of eliminating the unexpected interference and providing the desired identical interference intensities. The proposed system is a promising approach for fabricating high-uniformity two-dimensional crossed gratings with a relatively large grating period range of 500–1500 nm. Moreover, our rapid and stable approach for patterning period-tunable two-dimensional-array microstructures with high uniformity could be applicable to other multibeam interference lithography techniques.


Author(s):  
Mike Borisov ◽  
Dmitriy Chelubeev ◽  
Vitaly V. Chernik ◽  
Vadim Rakhovskiy ◽  
Alexei Shamaev

2020 ◽  
Vol 59 (8) ◽  
pp. 2521
Author(s):  
Rui Hou ◽  
Jia Yu ◽  
Yanyan Huang ◽  
Huaheng Ke ◽  
Huiping Liu

Nanoscale ◽  
2020 ◽  
Vol 12 (41) ◽  
pp. 21401-21408
Author(s):  
Bowen Liu ◽  
Chao Zhan ◽  
Xu Yao ◽  
Sen Yan ◽  
Bin Ren

A novel method to fabricate nanobowtie arrays over large areas with the advantages of tunable gap size, material and architecture.


2019 ◽  
Vol 22 ◽  
pp. 74-83
Author(s):  
Roxana Tomescu ◽  
Catalin Parvulescu ◽  
Dana Cristea ◽  
Bogdan Bita ◽  
Brandus Comanescu ◽  
...  

In this paper, we propose a new approach for fabrication processes of microstructures composed of diffractive optical elements (DOE) and security elements. The holographic lithography is combined with laser lithography to obtain highly secured holographic labels for products protection. The secret key is an untraceable and hardly reproducible geometry and can be embedded in the labels or stickers to increase the level of security and diminish the possibility of products counterfeiting. In our process, the holographic structure composed of DOEs, and the key are designed separately by two authorized designers and recombined using double exposure followed by a single development step. The layout of microstructures that composes the security key are known only by the designer.


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