Influence of high-temperature annealing on the characteristics of fast electron-irradiated p-n-structures based on neutron doped silicon

The investigation results of the annealing influence (Тann = 300–800 ºС) on the minority charge currier lifetime tP in the n-base of p-n-structures, manufactured on the base of neutron transmutation doped silicon (NTD) КОФ300, irradiated at room temperature by different fluences (F = 1 · 1014 – 3 · 1016 cm–2) of electrons with the energy of Еe = 4 MeV are presented. It is established that at low electron fluences (F = 1 · 1014 cm–2), the annealing of minority charge currier lifetime tP in the n-base of p-n-structures occurs in two stages: the first – 320–400 ºС and the second – 550–650 ºС. At higher electron fluences (F = 5 · 1015–2 · 1016 cm–2), three annealing stages occur: the first – 400–450 ºС, the second – 520–650 ºС and the third – 710–770 ºС. At this, the structure barrier capacitance C dependences on Тann at high electron fluences show the geometry capacitance up to the annealing temperatures Тann = 400 ºС. In the annealing temperature range of Тann = 420–570 ºС, the increase in С with maximum is seen at Тann = 480 ºС and a subsequent decrease in the geometry capacitance is seen in the annealing temperature range of Тann = 600–670 ºС, and then again the increase in С occurs in the annealing temperature range of Тann = 720–770 ºС reaching the С values corresponding to those of the non-irradiated samples in the annealing temperature range of Тann = 770–800 ºС. The analysis of the DLTS-spectra of the investigated structures has allowed establishing the formation in the annealing process of the deep acceptor level ЕС – 0.68 eV at Тann > 400 ºС, the deep donor level ЕС – 0.32 eV in the annealing temperature range of Тann = 420–570 ºС and the deep acceptor level ЕС – 0.53 eV at Тann > 700 ºС, which satisfactorily explains the dependences of t P and С on Тann obtained in this paper.

AN INVESTIGATION OF THE DOPING PROPERTIES OF ZnSe NANOCRYSTALS

This paper investigates the properties of ZnSe nanocrystals doped with single N , P or As atoms (for p-type doping) or single F , Cl or Br atoms (for n-type doping). The crystals are simulated using the local density functional method. Structures doped with an N or Cl atom remained symmetrical, but some distortion appeared with the other dopants. We found that N is the most efficient acceptor impurity for p-type doping, while Cl is the most suitable impurity for n-type doping. In the case of heavy p-type doping, complex defects such as N Se – Zn – V Se and N Se – Zn int easily form in the structure. We found that N Se – Zn – V Se produces a deep acceptor level in the bandgap, while N Se – Zn int produces a compensating donor level in p-type doping. The latter is the main reason for that p-type ZnSe is difficult to achieve. This study is useful to researchers investigating p- and n-type doping as well as device manufacturers.

Current Gain Simulation of Npn AlGaN/GaN Heterojunction Bipolar Transistors

ABSTRACTA drift-diffusion model has been used to explore the performance capabilities of Npn AlGaN/GaN heterojunction bipolar transistors. Numerical results have been employed to study the effect of the p-type Mg doping and its incomplete ionization on device performance. The high base resistance induced by the deep acceptor level is found to be the cause of limited current gain values for Npn devices. Several computation approaches have been considered to improve their performance. Reasonable improvement of the DC current gain β is observed by realistically reducing the base thickness in accordance with processing limitations. Base transport enhancement is also predicted by the introduction of a quasi-electric field in the base.

The Role of Hydrogen in Semi-Insulating Inp

ABSTRACTComplexes of vacancy at indium site with one to four hydrogen atoms and isolated hydrogen or hydrogen dimer and other infrared absorption lines, tentatively be assigned to hydrogen related defects were investigated by FTIR. Hydrogen can passivate imperfections, thereby eliminating detrimental electronic states from the energy bandgap.Incorporated hydrogen can introduce extended defects and generate electrically-active defects. Hydrogen also can acts as an actuator for creating of antistructure defects. Isolated hydrogen related defects(e.g. H12+) may play an important role in the conversion of the annealed wafers from semiconducting to the semi-insulating behavior. H2+ may be a deep donor, whose energy level is very near the iron deep acceptor level in the energy gap.

Behavior of Deep Defects After Hydrogen Passivation in Znte Studied by Photoluminescence and Photoconductivity

The effects of hydrogen passivation in undoped p-ZnTe single crystals were studied by photoluminescence (PL) and photoconductivity (PC) measurements. Samples were exposed to r.f hydrogen plasma at 250 °C for different durations. Before passivation PL peaks were observed at 2.06 eV, 1.47 eV, 1.33 eV and 1.06 eV. After 60 minutes exposure, samples showed strong band edge green luminescence at 2.37 eV due to an exciton bound to a Cu acceptor. Further exposure to plasma resulted in disappearance of 2.37eV and 2.34 eV peaks due to damage. In PC studies the dark current was found to decrease by a factor of 70 on 60 minutes passivation. From the temperature dependence of PC gain, the minority carrier lifetime τn, was found to go through a maximum of 4.5 × 10−7 sec at 220 K before passivation. After 60 minutes exposure, τn, remained constant at 4.5 × 10−7 sec for T > 220 K and decreased for T < 220 K. The activation energies of τn, were determined and show marked changes on passivation for T > 220 K. Comparison between PL and PC studies showed that the deep acceptor level OTe responsible for emission at 2.06 eV is passivated giving rise to strong band edge emission at 2.37 eV while emission due to the midgap impurity levels at 1.47, 1.33 and 1.05 eV remained unaffected. The thermal activation energies of the PL peaks have also been determined and allow the construction of a defect energy level diagram for ZnTe.