Change in the Parameters of Electron-Irradiated 4H-SiC Schottky Diodes as a Function of the Time during Low-Temperature Isothermal Annealing

In the present work, the kinetics of low-temperature annealing (400 °C) of 4H-SiC JBS diodes irradiated by electrons with an energy of 0.9 MeV and with a dose of 1E16 cm-2 was studied. The dynamics of changes in I-V, C-V characteristics, as well as DLTS spectra are shown. In the course of the work, a thermal cycling effect was discovered, i.e., effect of multiple rapid cooling to the temperature of liquid nitrogen and heating of the samples. As a result of thermal cycling, the barrier capacity increases and the on-resistance (Rs) decreases. In the DLTS spectrum, a level of - 0.38 eV appears, absent in the as-irradiated diodes.

On Deep Level Transient Spectroscopy of Extended Defects in n-Type 4H-SiC

We have performed capacitance-voltage (C-V) and deep level transient spectroscopy (DLTS) measurements on Schottky contacts fabricated on triangular defects in 4H-SiC epitaxial layers. These measurements are a case study on the effect of a specific extended defect on the DLTS spectrum in order to contribute to the physical understanding of curious features occasionally observed in DLTS spectra. Our measurements reveal an inversion of the DLTS signal depending on applied voltages and filling pulse lengths, and a step in the C-V characteristic of the Schottky diode. We present a model that qualitatively describes the experimentally obtained data. In this model, we assume that stacking faults within a triangular defect form quantum wells, which can capture electrons from other defects during the DLTS measurement leading to the inversion of the DLTS spectrum. Moreover, by calculating the differential capacitance using a self-consistent Schrödinger-Poisson-Solver, the step in the C-V measurements is reproduced by our model.

New Results on the Electrical Activity of 3d-Transition Metal Impurities in Silicon

In silicon several electronic levels are known which can be attributed to transition metals. Ignorance persists however about the specific nature of the defect centers. Some progress was made recently on identifying electronic levels from substitutional or interstitial lattice sites and on identifying levels from defect complexes. The sensitive Laplace DLTS technique allows us to determine depth profiles or the influence of the electrical field on the emission rate with unparalleled accuracy. Three examples will be discussed in this short review: The identification of the CoB pair, a reinterpretation of the Ti DLTS spectrum and the complex formation of interstitial Cu with substitutional Cu as the nucleation site.

DLTS Studies of Al Diffused n-Si

We have studied the electrical properties of Si p-n junction diodes by deep level transient spectroscopy (DLTS) measurements. The p-n junctions were developed on a Phosphorus doped Si by depositing Al and annealing at various temperatures. In order to confirm junction formation, current-voltage and capacitance-voltage measurements were made. Two deep levels at Ec-0.17 eV (E1) and Ec-0.44 eV (E2) were observed in the DLTS spectrum. These traps have been characterized by their capture cross-section, activation energy level and trap density. On the basis of these parameters, level E1 can be assigned as V-O complex and E2 as P-V complex. These traps are related to the growth of n-Si wafer and not due to Al diffusion.

Midgap Levels in As-Grown 4H-SiC Epilayers Investigated by DLTS

Midgap levels in 4H-SiC epilayers have been investigated by DLTS. The EH6/7 center (Ec-1.55 eV) is the dominant deep level as observed in DLTS spectra from n-type epilayers. The activation energy of EH6/7 center is unchanged regardless of applied electric fields, indicating that the charge state of EH6/7 center may be neutral after electron emission (acceptor-like). A DLTS spectrum for a p-type epilayer in the temperature range from 90 to 830 K is dominated by two peaks, D center and a deep trap at 1.49 eV from the valence band edge. Minority carrier traps have been also investigated by DLTS using pn diodes. Two minority carrier traps with activation energies of 1.0 eV and 1.43 eV have been detected.

Characterization of MBE Grown GaAs With Isoelectronic Doping of Indium or Antimony

ABSTRACTThe effects of In and Sb on the concentration of electron traps in MBE grown n-type GaAs are investigated. Two traps, labeled M3 and M6, dominate the DLTS spectrum. It is observed that at growth temperatures of 500 and 550° C their concentrations can be reduced by up to two orders of magnitude by the introduction of a few atomic percent of either In or Sb. The percent In or Sb producing the lowest trap concentrations decreases with increasing substrate temperature and thus for a substrate growth temperature of 600° C no additional improvement in the deep trap concentration is observed.