scholarly journals Characterization of Ultra Low-k SiOC(H) Film Deposited by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

2012 ◽  
Vol 13 (2) ◽  
pp. 69-72 ◽  
Author(s):  
Sang-Yong Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low K

Characterization of Carbon-Doped SiO[sub 2] Low k Thin Films: Preparation by Plasma-Enhanced Chemical Vapor Deposition from Tetramethylsilane

2001 ◽  
Vol 148 (7) ◽  
pp. F148 ◽  
Author(s):  
Licheng M. Han ◽  
Ji-Sheng Pan ◽  
Shou-Mian Chen ◽  
N. Balasubramanian ◽  
Jianou Shi ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Doped ◽  
Low K

Chemical vapor deposition growth and characterization of AlGaN nanowires

2015 ◽  
Vol 32 (6) ◽  
pp. 638
Author(s):  
Xingmin Cai ◽  
Xiaoqiang Su ◽  
Fan Ye ◽  
Huan Wang ◽  
Guangxing Liang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth

Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

2020 ◽  
Vol 13 (7) ◽  
pp. 075505
Author(s):  
Tomohiro Yamaguchi ◽  
Hiroki Nagai ◽  
Takanori Kiguchi ◽  
Nao Wakabayashi ◽  
Takuto Igawa ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Α Al2o3

Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET

2021 ◽  
Author(s):  
A. Ramos-Carrazco ◽  
J. A. Gallardo-Cubedo ◽  
A. Vera-Marquina ◽  
A. L. Leal-Cruz ◽  
J. R. Noriega ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Active Layer ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Zno Films
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