Ion beam etching of large aperture diffractive optical elements

2012 ◽  
Vol 20 (8) ◽  
pp. 1676-1683
Author(s):  
邱克强 QIU Ke-qiang ◽  
周小为 ZHOU Xiao-wei ◽  
刘颖 LIU Ying ◽  
徐向东 XU Xiang-dong ◽  
刘正坤 LIU Zheng-kun ◽  
...  
2015 ◽  
Author(s):  
J. Schmitt ◽  
Ch. Bischoff ◽  
U. Rädel ◽  
M. Grau ◽  
U. Wallrabe ◽  
...  

2019 ◽  
Vol 48 (1) ◽  
pp. 131002
Author(s):  
冯时 FENG Shi ◽  
付秀华 FU Xiu-hua ◽  
王大森 WANG Da-sen ◽  
李晓静 LI Xiao-jing ◽  
聂凤明 NIE Feng-ming ◽  
...  

1990 ◽  
Vol 216 ◽  
Author(s):  
M.B. Stem ◽  
W.F. Delaney ◽  
M. Holz ◽  
K.P. Kunz ◽  
K.R. Maschhoff ◽  
...  

ABSTRACTArrays of miniature focusing optics located at the focal plane can improve the performance of focal plane systems. By more completely collecting the light at the focal plane and concentrating it into a smaller spot size on the detector plane, the photodetector area can be substantially reduced. Increased gamma radiation hardening and noise reduction result from the decrease in photodetector surface area. Binary optics technology, a process for fabricating large arrays of diffractive optical elements, is especially attractive for infrared materials. In this paper, diffractive Fresnel microlens arrays containing over six thousand F/0.9 lenslets are patterned in the surface of CdTe substrates by successive photolithographic and Ar+ ion-beam-etching steps. Results on smaller arrays of monolithically integrated binary-optics lenslets with II-VI detectors, demonstrating enhanced photodetector responsivities, are presented for the first time.


Sign in / Sign up

Export Citation Format

Share Document