scholarly journals Deposition of Al Thin Film on Steel Substrate: The Role of Thickness on Crystallization and Grain Growth

Metals ◽  
2018 ◽  
Vol 9 (1) ◽  
pp. 12 ◽  
Author(s):  
Hayk Khachatryan ◽  
Sung-Nam Lee ◽  
Kyoung-Bo Kim ◽  
Moojin Kim

In this study, we deposited aluminum (Al) films of different thicknesses on steel substrate and examined their phase, microstructure, and film growth process. We estimated that films of up to 30 nm thickness were mainly amorphous in nature. When the film thickness exceeded 30 nm, crystallization was observed. The further increase in film thickness triggered grain growth, and the formation of grains up to 40 nm occurred. In such cases, the Al film had a cross-grained structure with well-developed primary grains networks that were filled with small secondary grains. We demonstrated that the microstructure played a key role in optical properties. The films below 30 nm showed higher specular reflection, whereas thicker films showed higher diffuse reflections.

1995 ◽  
Vol 391 ◽  
Author(s):  
Choong-Un Kim ◽  
S. H. Kang ◽  
F.Y. Génin ◽  
J. W. Morris

AbstractIn order to understand the role of Sc on electromigration (EM) failure, Al interconnects with 0.1 and 0.3 wt.% Sc were tested as a function of post-pattern annealing time. In response to the evolution of the line structure, the statistics of lifetime evolved. While the addition of Sc greatly reduces the rate of evolution of the failure statistics because the grain growth rate decreases, the MTF variation was found to be very similar to that of pure Al. These observations seem to show that Sc has little influence on the kinetics of Al EM; however, it has some influence on the EM resistance of the line since it is an efficient grain refiner. Unlike Cu in Al, Sc does not seem to migrate, which may explain its lack of influence on the kinetics of Al EM.


2020 ◽  
Vol 5 (1) ◽  
pp. 75-85
Author(s):  
Kartika Yulianti ◽  
Agus Yodi Gunawan ◽  
Edy Soewono

The effect of surfactant on the thickness of a thin film bounded by a solid surface and a moving liquid drop was investigated. We proposed a model so that parameters from the liquid drop can be stated in a parameter that acts as normal pressure to the thin film. Using the lubrication approximation, the model was reduced to a set of nonlinear partial differential equations in terms of the film thickness and surfactant concentration. Since we were interested in the role of the surfactant in lifting up the drop, we assumed that the density of the drop is higher than the density of the thin film. Numerically, the results show that the presence of the surfactant tends to delay the decrease of the film thickness insignificantly. However, when the surfactant was added into the system, it tends to significantly increase the film thickness for a certain range value of the normal pressure.


Optik ◽  
2019 ◽  
Vol 199 ◽  
pp. 163517 ◽  
Author(s):  
Mahsa Etminan ◽  
Nooshin. S. Hosseini ◽  
Narges Ajamgard ◽  
Ataalah Koohian ◽  
Mehdi Ranjbar

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