scholarly journals Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering

Materials ◽  
2019 ◽  
Vol 12 (12) ◽  
pp. 1981 ◽  
Author(s):  
Zhongkai Zhang ◽  
Bian Tian ◽  
Yan Liu ◽  
Zhe Du ◽  
Qijing Lin ◽  
...  
Keyword(s):  
Thin Film ◽  
Silicon Carbide ◽  
Magnetron Sputtering ◽  
Temperature Difference ◽  
Protective Coating ◽  
Coating Layer ◽  
Response Speed ◽  
Rf Magnetron Sputtering ◽  
Junction Temperature ◽  
Thin Film Thermocouples

A thin-film thermocouples (TFTCs) sensor based on silicon carbide substrate, 95 wt% tungsten–5 wt% rhenium (W-5Re) and 74 wt% tungsten–26 wt% rhenium (W-26Re) thermosensitive part with aluminum oxide protective coating layer was designed and fabricated by radio frequency (RF) magnetron sputtering. It exhibited a high thermoelectric voltage of 35.51 mV when the temperature difference was 1240 °C (the hot junction temperature was 1420 °C), with an average Seebeck coefficient of 28.63 µV/°C, which was 27% larger than the standard C-type thermocouple wires at the same temperature difference. The repeatability error was ±4.1%, the drift rate was 9.6 °C/h for 10 h and the laser response time was 0.36 ms. Compared to the traditional thermocouple, it could provide long-term temperature testing within 1420 °C for the requirement of high-temperature measurement and high response speed.

Enhanced UV Photon-response of Tin Nano Cluster Loaded- laser Irradiated ZnO Thin film detector

2011 ◽  
Vol 1288 ◽  
Author(s):  
Rashmi Menon ◽  
K. Sreenivas ◽  
Vinay Gupta
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Surface States ◽  
Response Speed ◽  
Rf Magnetron Sputtering ◽  
Fast Response ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Photo Response

ABSTRACTZinc Oxide (ZnO), II-VI compound semiconductor, is a promising material for ultraviolet (UV) photon sensor applications due to its attractive properties such as good photoconductivity, ease processing at low temperatures and excellent radiation hardness. The rf magnetron sputtering is a suitable deposition technique due to better control over stoichiometry and deposition of uniform film. Studies have shown that the presence of surface defects in ZnO and subsequently their passivation are crucial for enhanced photo-response characteristics, and to obtain the fast response speed. Worldwide efforts are continuing to develop good quality ZnO thin films with novel design structures for realization of an efficient UV photon sensor. In the present work, UV photon sensor is fabricated using a ZnO thin films deposited by rf magnetron sputtering on the corning glass substrate. Photo-response, (Ion/Ioff) of as-grown ZnO film of thickness 100 nm is found to be 3×103 with response time of 90 ms for UV intensity of 140 μW/cm2 (λ = 365 nm). With irradiation on ZnO thin film by pulsed Nd:YAG laser (forth harmonics 266 nm), the sensitivity of the UV sensor is found to enhance. The photo-response increases after laser irradiation to 4x104 with a fast response speed of 35 ms and attributed to the change in surface states and the native defects in the ZnO thin film. Further, enhancement in the ultraviolet (UV) photo-response (8×104) of detector was observed after integrating the nano-scale islands of Sn metal on the surface of laser irradiated ZnO thin film.

scholarly journals Effect of heat treatment on thermoelectric properties of tungsten-rhenium thin-film thermocouples by RF magnetron sputtering

AIP Advances ◽  
2018 ◽  
Vol 8 (12) ◽  
pp. 125113 ◽  
Author(s):  
Zhongkai Zhang ◽  
Bian Tian ◽  
Zhe Du ◽  
Qijing Lin ◽  
Peng Shi ◽  
...  
Keyword(s):  
Thin Film ◽  
Heat Treatment ◽  
Magnetron Sputtering ◽  
Thermoelectric Properties ◽  
Rf Magnetron Sputtering ◽  
Thin Film Thermocouples

scholarly journals Effect of Annealing on the Thermoelectricity Properties of the WRe26-In2O3 Thin Film Thermocouples

Micromachines ◽  
2020 ◽  
Vol 11 (7) ◽  
pp. 664
Author(s):  
Bian Tian ◽  
Yan Liu ◽  
Zhongkai Zhang ◽  
Zhaojun Liu ◽  
Libo Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Annealing Process ◽  
Practical Applications ◽  
Thermoelectric Voltage ◽  
Voltage Output ◽  
Thin Film Thermocouples ◽  
Future Work ◽  
Thermoelectric Stability

WRe26-In2O3 (WRe26 (tungsten-26% rhenium) and In2O3 thermoelectric materials) thin film thermocouples (TFTCs) have been fabricated based on magnetron sputtering technology, which can be used in temperature measurement. Many annealing processes were studied to promote the sensitivity of WRe26-In2O3 TFTCs. The optimal annealing process of the thermocouple under this kind of RF magnetron sputtering method was proposed after analyzing the properties of In2O3 films and the thermoelectric voltage of TFTCs at different annealing processes. The calibration results showed that the WRe26-In2O3 TFTCs achieved a thermoelectric voltage of 123.6 mV at a temperature difference of 612.9 K, with a sensitivity of up to 201.6 µV/K. Also, TFTC kept a stable thermoelectric voltage output at 973 K for 20 min and at 773 K for two hours. In general, the WRe26-In2O3 TFTCs developed in this work have great potential for practical applications. In future work, we will focus on the thermoelectric stability of TFTCs at higher temperatures.

Effect of Al2O3-doping on the structure and optoelectronic characteristics of MgZnO thin film prepared by RF magnetron sputtering

2021 ◽  
Vol 127 (7) ◽  
Author(s):  
Du-Cheng Tsai ◽  
Feng-Kuan Chen ◽  
Zue-Chin Chang ◽  
Bing-Hau Kuo ◽  
Erh-Chiang Chen ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Al2o3 Doping

Electron Conduction of Nd0.6Sr0.4FeO3−δ Thin Film with Oxygen Vacancies Prepared by RF Magnetron Sputtering

2017 ◽  
Vol 86 (7) ◽  
pp. 074704 ◽  
Author(s):  
Wataru Namiki ◽  
Takashi Tsuchiya ◽  
Makoto Takayanagi ◽  
Shoto Furuichi ◽  
Makoto Minohara ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Oxygen Vacancies ◽  
Rf Magnetron Sputtering ◽  
Electron Conduction

125MeV Si9+ ion irradiation of calcium phosphate thin film coated by rf-magnetron sputtering technique

2011 ◽  
Vol 257 (6) ◽  
pp. 2134-2141 ◽  
Author(s):  
K. Elayaraja ◽  
M.I. Ahymah Joshy ◽  
R.V. Suganthi ◽  
S. Narayana Kalkura ◽  
M. Palanichamy ◽  
...  
Keyword(s):  
Thin Film ◽  
Calcium Phosphate ◽  
Magnetron Sputtering ◽  
Ion Irradiation ◽  
Rf Magnetron Sputtering

Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering

2003 ◽  
Vol 82 (7) ◽  
pp. 1117-1119 ◽  
Author(s):  
P. F. Carcia ◽  
R. S. McLean ◽  
M. H. Reilly ◽  
G. Nunes
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thin Film Transistor ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Film
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