Bias Stability Enhancement in Thin-Film Transistor with a Solution-Processed ZrO2 Dielectric as Gate Insulator
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2017 ◽
Vol 651
(1)
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pp. 235-242
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2017 ◽
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2019 ◽
Vol 476
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pp. 374-377
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2016 ◽
Vol 16
(3)
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pp. 2632-2636
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