scholarly journals PHOTO-CATALYTIC TRANSPARENT HEAT MIRROR FILM TiO2/TiN/TiO2

2009 ◽  
Vol 12 (3) ◽  
pp. 24-32
Author(s):  
Tran Le ◽  
Nhuan Duy Nguyen ◽  
Cuong Hung Ngo ◽  
Chi Huu Nguyen ◽  
Tuan Tran
Keyword(s):  
Layer Thickness ◽  
Catalytic Properties ◽  
Visible Region ◽  
Infrared Region ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Optimum Thickness ◽  
Tio2 Layer ◽  
Glass Substrates ◽  
High Reflectance

Transparenet heat mirror thin films, having high transmittance in the visible region and high reflectance in the infrared region. TiO/TiN/TiO2 films prepared D.C reactive magnetron sputtering method on glass substrates, play role as transparent heat mirror. Besides, the top TiO2 layer has both photo-catalytic and anti-reflective properties. However, st ong thickness dependence of top layer on catalytic properties is a problem need to solve. The experiment shows optimum thickness in order to have good catalytic properties is above 350 nm. This report, we found relationship among thicknesses of films through calculating and experiment. Films prepared, have both catalytic and transparent heat mirror properties with the bottom Tio, layer thickness of 40-300 nm, the middle TiN layer thickness of 16-22 nm and the top TiO2 layer of above 350 nm.

scholarly journals Design and fabrication of a semi-transparent solar cell considering the effect of the layer thickness of MoO3/Ag/MoO3 transparent top contact on optical and electrical properties

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Çağlar Çetinkaya ◽  
Erman Çokduygulular ◽  
Barış Kınacı ◽  
Feyza Güzelçimen ◽  
Yunus Özen ◽  
...  
Keyword(s):  
Solar Cell ◽  
Layer Thickness ◽  
High Performance ◽  
Near Infrared ◽  
Visible Region ◽  
Infrared Region ◽  
Experimental Comparison ◽  
Top Contact ◽  
Cie Chromaticity ◽  
Design And Manufacture

AbstractWe conducted the present study to design and manufacture a semi-transparent organic solar cell (ST-OSC). First, we formed a transparent top contact as MoO3/Ag/MoO3 in a dielectric/metal/dielectric (DMD) structure. We performed the production of an FTO/ZnO/P3HT:PCBM/MoO3/Ag/MoO3 ST-OSC by integrating MoO3/Ag/MoO3 (10/$$d_{m}$$ d m /$$d_{{od}}$$ d od nm) instead of an Ag electrode in an opaque FTO/ZnO/P3HT:PCBM/MoO3/Ag (–/40/130/10/100 nm) OSC, after theoretically achieving optimal values of optical and electrical parameters depending on Ag layer thickness. The transparency decreased with the increase of $$d_{m}$$ d m values for current DMD. Meanwhile, maximum transmittance and average visible transmittance (AVT) indicated the maximum values of over 92% for $$d_{m} ~$$ d m  = 4 and 8 nm, respectively. For ST-OSCs, the absorption and reflectance increased in the visible region by a wavelength of longer than 560 nm and in the whole near-infrared region by increasing $$d_{m}$$ d m up to 16 nm. Moreover, in the CIE chromaticity diagram, we reported a shift towards the D65 Planckian locus for colour coordinates of current ST-OSCs. Electrical analysis indicated the photogenerated current density and AVT values for $$d_{m} = 6$$ d m = 6  nm as 63.30 mA/cm2 and 38.52%, respectively. Thus, the theoretical and experimental comparison of optical and electrical characteristics confirmed that the manufactured structure is potentially conducive for a high-performance ST-OSC.

A Study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption Properties in Visible Region

2005 ◽  
Vol 475-479 ◽  
pp. 1223-1226 ◽  
Author(s):  
Ming Zhao ◽  
Da Ming Zhuang ◽  
Gong Zhang ◽  
Ling Fang ◽  
Min Sheng Wu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Absorption Edge ◽  
Visible Region ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Doped Tio2 ◽  
Nitrogen Doped

The nitrogen-doped TiO2 thin films were prepared by mid-frequency alternative reactive magnetron sputtering technique. The N concentration of the nitrogen-doped TiO2 thin films was analyzed by XPS. And the absorption spectra of the films in ultraviolet and visible region were also investigated. The results show that the mid-frequency alternative reactive magnetron sputtering technique is a convenient method for growing TiO2-xNx. Annealing the nitrogen-doped TiO2 thin film in nitrogen atmosphere under 380°C is helpful for increase the concentration of nitrogen in the film, but the ratio of N2 in reactive gas is mainly influence the concentration of nitrogen in the Ti-N bond in the TiO2 film. The increase of the thickness of nitrogen-doped TiO2 films will enhance the absorbability of the film in the ultraviolet and visible region. The wavelength of the absorption edge of TiO2-xNx film with 1.5% nitrogen shift to 441nm from 387nm, which is the absorption edge for undoped TiO2 films.

scholarly journals Wetting Properties of Transparent Anatase/Rutile Mixed Phase Glancing Angle Magnetron Sputtered Nano-TiO2 Films

Micromachines ◽  
2020 ◽  
Vol 11 (6) ◽  
pp. 616
Author(s):  
Vasiliki Vrakatseli ◽  
Ergina Farsari ◽  
Dimitrios Mataras
Keyword(s):  
Thin Films ◽  
Phase Composition ◽  
Gas Mixture ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Nano Tio2 ◽  
Wetting Properties ◽  
Glass Substrates ◽  
Glancing Angle

Transparent polycrystalline TiO2 thin films have been deposited on unheated glass substrates using RF reactive magnetron sputtering. Depositions were carried out at different glancing angles and with different total gas mixture pressures. The variation of these parameters affected the crystal phase composition and the surface morphology. Depending on the glancing angle and the pressure, rutile, mixed anatase/ rutile and pure anatase were deposited at low substrate temperature. Both hydrophilic and hydrophobic TiO2 were obtained, exhibiting fast photoconversion to superhydrophilic upon UV irradiation. The effect of the materials physicochemical properties on the wettability and rate of the UV induced superhydrophilicity is evaluated.

scholarly journals ANÁLISIS DE COMPONENTES PRINCIPALES DE IMÁGENES MULTIESPECTRALES EN EL ÁMBITO DEL ARTE RUPESTRE

2017 ◽  
Author(s):  
Berta Carrión-Ruiz ◽  
José Luis Lerma
Keyword(s):  
Principal Component Analysis ◽  
Near Infrared ◽  
Rock Art ◽  
Visible Region ◽  
Principal Component ◽  
Optical Filters ◽  
Infrared Region ◽  
Spectral Behaviour ◽  
Near Infrared Region ◽  
Art Analysis

This paper tackles principal component analysis (PCA) in images that include wavelengths between 380-1000 nm. Our approach is focussed on taking advantage of the potencial of ultraviolet and infrarred images, in combination with the visible ones, to improve documentation process and rock art analysis. In this way, we want to improve the discrimination between pigment and support rock, and analyse the spectral behaviour of rock art paintings in the ultraviolet and infrared regions. Three images were used, one image from the ultraviolet (UV) region, one from the visible region (VIS) and another one from the near infrared region (NIR). Optical filters coupled to the camera optics were used to take the images. These filters capture specific wavelengths excluding radiation that we are not interested in registering. Finally, PCA is applied to the acquired images. The results obtained demonstrate the PCA usefulness with imagery in this field and also it is possible to extract some conclusions about the correspondent paint pigments.http://dx.doi.org/10.4995/CIGeo2017.2017.6597

scholarly journals INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

2001 ◽  
Vol 50 (7) ◽  
pp. 1390
Author(s):  
ZHAO KUN ◽  
ZHU FENG ◽  
WANG LI-FANG ◽  
MENG TIE-JUN ◽  
ZHANG BAO-CHENG ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron

CHLOROPHYLL ANALYSIS OF WHOLE RAPESEED KERNELS BY NEAR INFRARED REFLECTANCE

1982 ◽  
Vol 62 (4) ◽  
pp. 875-884 ◽  
Author(s):  
RUSSELL TKACHUK ◽  
F. D. KUZINA
Keyword(s):  
Chlorophyll Content ◽  
Near Infrared ◽  
Good Accuracy ◽  
Visible Region ◽  
Infrared Region ◽  
Multiple Correlation Coefficient ◽  
Multiple Correlation ◽  
Near Infrared Reflectance ◽  
Laboratory Results ◽  
Near Infrared Region

Chlorophyll content was determined in whole rapeseed samples, from Regent and Candle cultivars, by using a reflectance technique in the visible and near infrared region. Chlorophyll content was estimated with good accuracy when predicted results for 42 samples of Regent, 37 samples of Candle and 79 samples for both cultivars combined were compared with standard laboratory results. For Regent, a multiple correlation coefficient (R) of 0.944 and a standard error of estimate (Sy) of 4.7 were obtained when reflectance was measured at six wavelengths. For Candle, R = 0.963 and Sy = 4.4, using another six wavelengths. For both cultivars combined, R = 0.939 and Sy = 4.8, again using a different set of six wavelengths. Wavelengths for predicting chlorophyll were selected from the 630-to 754-nm visible region, and from the 1640- to 2176-nm near infrared region. This reflectance method described for whole rapeseed is rapid, involves no sample preparation, and leaves the seed intact and available for other uses.

scholarly journals Optical properties of spray pyrolysis deposited Cds:Al thin films

2015 ◽  
Vol 39 (1) ◽  
pp. 25-30 ◽  
Author(s):  
A Hasnat Rubel ◽  
J Podder
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Spray Pyrolysis ◽  
Near Infrared ◽  
Visible Region ◽  
Cadmium Sulphide ◽  
Infrared Region ◽  
Photo Detectors ◽  
Direct Energy ◽  
Academy Of Sciences

Aluminium doped cadmium sulphide thin films were prepared on glass substrate using aqueous solution of cadmium sulphide and thiourea salts by spray pyrolysis deposition (SPD) technique. Its optical properties were analyzed as a function of doping concentration. The direct energy band-gap of Al-doped CdS films was estimated in the range of 2.25 to 2.48 eV. The optical spectra of Cd1-xAlxS ternary system exhibit high absorption near visible region and transmission throughout the near-infrared region (600 - 1200 nm). Thus so obtained hetero-junction films are suitable for fabrication of photo detectors, solar cells and other optoelectronics devices.Journal of Bangladesh Academy of Sciences, Vol. 39, No. 1, 25-30, 2015

Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

2007 ◽  
Vol 124-126 ◽  
pp. 999-1002 ◽  
Author(s):  
Han Na Cho ◽  
Jang Woo Lee ◽  
Su Ryun Min ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Visible Region ◽  
Film Surface ◽  
Optical Transmittance ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Indium Zinc Oxide

Indium zinc oxide (IZO) thin films were deposited on a glass substrate by radio frequency (rf) reactive magnetron sputtering method. As the rf power increased, the deposition rate and resistivity increased while the optical transmittance decreased owing to the increase of grain size. With increasing gas pressure, the resistivity increased and the transmittance decreased. Atomic force microscopy and scanning electron microscopy were employed to observe the film surface. The IZO films displayed a resistivity of 3.8 × 10-4 Ω cm and a transmittance of about 90% in visible region.

scholarly journals Assessment of Potential of the High-Voltage Anodic Plasma Source to Deposit Multilayer Structures Relevant to X-ray Mirror Applications

Coatings ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 531
Author(s):  
Aurel-Mihai Vlaicu ◽  
Alexandru Anghel ◽  
Marius Badulescu ◽  
Cristina Surdu-Bob
Keyword(s):  
Film Thickness ◽  
Layer Thickness ◽  
Deposition Rate ◽  
High Voltage ◽  
Plasma Source ◽  
Multilayer Structures ◽  
Deposition Technique ◽  
X Ray ◽  
Coating Technique ◽  
Glass Substrates

(1) Background: The high-voltage anodic-plasma (HVAP) coating technique has a series of specificities that are not simultaneously met in other deposition methods. This paper aimed at assessing the potential of HVAP to synthesize quality multilayers for X-ray optics. (2) Methods: Nanolayers of W, Ta, B, and Si were deposited as mono-, bi-, and multilayers onto very smooth glass substrates by HVAP, and their thickness and density were analyzed by X-ray reflectometry. The minimal film thickness needed to obtain continuous nanolayers was also investigated. (3) Results: Nanolayer roughness did not increase with layer thickness, and could be lowered via deposition rate, with values as low as 0.6 for the W nanolayer. Minimal film thickness for continuous films for the studied metals was 4 nm (W), 6 nm (Ta), 2.5 nm (B), and 6 nm (Si). (4) Conclusions: The investigation revealed the range of parameters to be used for obtaining quality nanolayers and multilayers by HVAP. Advantages and possible improvements are discussed. This deposition technique can be tailored for demanding applications such as X-ray mirrors.

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