scholarly journals Wetting Properties of Transparent Anatase/Rutile Mixed Phase Glancing Angle Magnetron Sputtered Nano-TiO2 Films

Micromachines ◽  
2020 ◽  
Vol 11 (6) ◽  
pp. 616
Author(s):  
Vasiliki Vrakatseli ◽  
Ergina Farsari ◽  
Dimitrios Mataras
Keyword(s):  
Thin Films ◽  
Phase Composition ◽  
Gas Mixture ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Nano Tio2 ◽  
Wetting Properties ◽  
Glass Substrates ◽  
Glancing Angle

Transparent polycrystalline TiO2 thin films have been deposited on unheated glass substrates using RF reactive magnetron sputtering. Depositions were carried out at different glancing angles and with different total gas mixture pressures. The variation of these parameters affected the crystal phase composition and the surface morphology. Depending on the glancing angle and the pressure, rutile, mixed anatase/ rutile and pure anatase were deposited at low substrate temperature. Both hydrophilic and hydrophobic TiO2 were obtained, exhibiting fast photoconversion to superhydrophilic upon UV irradiation. The effect of the materials physicochemical properties on the wettability and rate of the UV induced superhydrophilicity is evaluated.

A Study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption Properties in Visible Region

2005 ◽  
Vol 475-479 ◽  
pp. 1223-1226 ◽  
Author(s):  
Ming Zhao ◽  
Da Ming Zhuang ◽  
Gong Zhang ◽  
Ling Fang ◽  
Min Sheng Wu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Absorption Edge ◽  
Visible Region ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Doped Tio2 ◽  
Nitrogen Doped

The nitrogen-doped TiO2 thin films were prepared by mid-frequency alternative reactive magnetron sputtering technique. The N concentration of the nitrogen-doped TiO2 thin films was analyzed by XPS. And the absorption spectra of the films in ultraviolet and visible region were also investigated. The results show that the mid-frequency alternative reactive magnetron sputtering technique is a convenient method for growing TiO2-xNx. Annealing the nitrogen-doped TiO2 thin film in nitrogen atmosphere under 380°C is helpful for increase the concentration of nitrogen in the film, but the ratio of N2 in reactive gas is mainly influence the concentration of nitrogen in the Ti-N bond in the TiO2 film. The increase of the thickness of nitrogen-doped TiO2 films will enhance the absorbability of the film in the ultraviolet and visible region. The wavelength of the absorption edge of TiO2-xNx film with 1.5% nitrogen shift to 441nm from 387nm, which is the absorption edge for undoped TiO2 films.

Effects of Boron-Doped on Photocatalysis and Hydrophilicity of TiO2 Film

2007 ◽  
Vol 336-338 ◽  
pp. 1924-1926 ◽  
Author(s):  
Hong Li ◽  
Gao Ling Zhao ◽  
Gang Xu ◽  
Gao Rong Han
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Sol Gel ◽  
Tio2 Films ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Glass Substrates ◽  
Atomic Force ◽  
Boron Doped

In order to investigate the effects of doping boron on the self-cleaning properties of TiO2 thin films, sol-gel method was employed to prepare TiO2 films with various amount of boron on the glass substrates. Atomic Force Microscope (AFM) and X-ray diffraction (XRD) were carried out to investigate the effects of boron on the microstructure and crystallization behavior of the thin films. The photocatalytic activity and the hydrophilicity of the films were also measured. The results showed that the photocatalytic activity of TiO2 films was improved by doping boron, and its hydrophilicity wasn’t destroyed. This can be ascribed to the enhancement of the surface energy, which was caused by the reduction of the crystal grain size of TiO2.

scholarly journals Laser wavelength and energy effect on optical and structure properties for nano titanium oxide prepared by pulsed laser deposit

2019 ◽  
Vol 12 (25) ◽  
pp. 62-68
Author(s):  
Farah Hattab
Keyword(s):  
Thin Films ◽  
Laser Energy ◽  
Pulsed Laser ◽  
Optical Transmittance ◽  
Laser Wavelength ◽  
Tio2 Films ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
Energy Effect ◽  
Glass Substrates

Nano TiO2 thin films on glass substrates were prepared at a constant temperature of (373 K) and base vacuum (10-3 mbar), by pulsed laser deposition (PLD) using Nd:YAG laser at 1064 nm wavelength. The effects of different laser energies between (700-1000)mJ on the properties of TiO2 films was investigated. TiO2 thin films were characterized by X-ray diffraction (XRD) measurements have shown that the polycrystalline TiO2 prepared at laser energy 1000 mJ. Preparation also includes optical transmittance and absorption measurements as well as measuring the uniformity of the surface of these films. Optimum parameters have been identified for the growth of high-quality TiO2 films.

Preparation and characterization of V2O5 doped SiO2-TiO2 thin films

2012 ◽  
Vol 2 (1) ◽  
Author(s):  
Marek Nocuń ◽  
Sławomir Kwaśny
Keyword(s):  
Thin Films ◽  
Band Gap ◽  
Photoelectron Spectroscopy ◽  
Sol Gel ◽  
Dip Coating ◽  
Band Gap Energy ◽  
Tio2 Thin Films ◽  
Glass Substrates ◽  
Gel Technique

AbstractIn our investigation, V doped SiO2/TiO2 thin films were prepared on glass substrates by dip coating sol-gel technique. Chemical composition of the samples was studied by X-ray photoelectron spectroscopy (XPS). Transmittance of the samples was characterized using UV-VIS spectrophotometry. Subsequently band-gap energy (Eg) was estimated for these films. Powders obtained from sols were characterized by FTIR spectroscopy. It was found that vanadium decreases optical band gap of SSiO2/TiO2 films.

Epitaxy of Porous and Photocatalytically Active TiO2 Films at 50°C

2011 ◽  
Vol 64 (9) ◽  
pp. 1235 ◽  
Author(s):  
Gregory K. L. Goh ◽  
Kelvin Y. S. Chan ◽  
Gao S. Huang ◽  
Qui L. Tay
Keyword(s):  
Thin Films ◽  
Methylene Blue ◽  
Liquid Phase ◽  
Anatase Tio2 ◽  
Blue Dye ◽  
Tio2 Films ◽  
Methylene Blue Dye ◽  
Liquid Phase Deposition ◽  
Grown Film ◽  
Tio2 Thin Films

Epitaxial anatase TiO2 thin films were grown on (001) oriented SrTiO3 single crystal substrates by liquid phase deposition at 50°C. The film consisted of nanosized crystallites and exhibited a significant void fraction of 31 %. This contributed to the cracking of thicker films due to the generation of capillary stresses in the nanosized pores during drying. This porosity also comes in useful during the photodegradation of a methylene blue dye by an as-grown film.

scholarly journals PHOTO-CATALYTIC TRANSPARENT HEAT MIRROR FILM TiO2/TiN/TiO2

2009 ◽  
Vol 12 (3) ◽  
pp. 24-32
Author(s):  
Tran Le ◽  
Nhuan Duy Nguyen ◽  
Cuong Hung Ngo ◽  
Chi Huu Nguyen ◽  
Tuan Tran
Keyword(s):  
Layer Thickness ◽  
Catalytic Properties ◽  
Visible Region ◽  
Infrared Region ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Optimum Thickness ◽  
Tio2 Layer ◽  
Glass Substrates ◽  
High Reflectance

Transparenet heat mirror thin films, having high transmittance in the visible region and high reflectance in the infrared region. TiO/TiN/TiO2 films prepared D.C reactive magnetron sputtering method on glass substrates, play role as transparent heat mirror. Besides, the top TiO2 layer has both photo-catalytic and anti-reflective properties. However, st ong thickness dependence of top layer on catalytic properties is a problem need to solve. The experiment shows optimum thickness in order to have good catalytic properties is above 350 nm. This report, we found relationship among thicknesses of films through calculating and experiment. Films prepared, have both catalytic and transparent heat mirror properties with the bottom Tio, layer thickness of 40-300 nm, the middle TiN layer thickness of 16-22 nm and the top TiO2 layer of above 350 nm.

scholarly journals Photocatalytic Degradation of Different VOCs in the Gas-Phase over TiO2 Thin Films Prepared by Ultrasonic Spray Pyrolysis

Catalysts ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 915 ◽  
Author(s):  
Ibrahim Dundar ◽  
Marina Krichevskaya ◽  
Atanas Katerski ◽  
Malle Krunks ◽  
Ilona Oja Acik
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Photocatalytic Degradation ◽  
Spray Pyrolysis ◽  
Tio2 Thin Film ◽  
Ultrasonic Spray Pyrolysis ◽  
Airflow Rate ◽  
Tio2 Films ◽  
Tio2 Thin Films ◽  
Ultrasonic Spray

In this study, we deposited TiO2 thin films onto borosilicate glass by ultrasonic spray pyrolysis at 350 and 450 °C. The aim of study is to determine the effect of deposition temperature on photocatalytic activity of TiO2 thin films and to investigate the performance of TiO2 thin films on photocatalytic degradation of methyl tert-butyl ether (MTBE), acetone, acetaldehyde, and heptane as functions of different operating parameters. TiO2 thin films deposited at 350 and 450 °C have a thickness value of 190 and 330 nm, respectively. All as-prepared TiO2 films possess an anatase crystalline structure. According to the X-ray photon spectroscopy (XPS) study, the TiO2 thin film deposited at 350 °C showed a higher amount of oxygen vacancies and hydroxyl groups on the film surface after UV treatment. The aged-TiO2 thin film deposited at 350 °C showed a water contact angle (WCA) value of 0° after 10 min UV irradiation, showing superhydrophilic surface behavior. The TiO2 film deposited at 350 °C exhibited the highest amount of conversion of MTBE (100%). The results also showed that TiO2 films are capable of photocatalytic degradation of MTBE (100%) and acetaldehyde (approx. 80%) in humid air conditions and high airflow rate. The visible-light-activity of TiO2 thin films was tested with 5 ppm MTBE and acetone. TiO2 thin films deposited at 350 °C with a surface area of 600 cm2 showed 60% of MTBE and 33% of acetone degradation under VIS light.

Sign in / Sign up

Export Citation Format

Share Document