Effect of Substrate Bipolar Pulse Voltage on the Properties of Cu Films on the Paper Substrate Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Fumiya MORISHIGE; Kazuki OTANI; Muneo HIRANO; Keishi KAWABATA; Keishi OKAMOTO

doi:10.3131/jvsj2.54.199

Effect of Substrate Bipolar Pulse Voltage on the Properties of Cu Films on the Paper Substrate Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.54.199 ◽

2011 ◽

Vol 54 (3) ◽

pp. 199-202

Author(s):

Fumiya MORISHIGE ◽

Kazuki OTANI ◽

Muneo HIRANO ◽

Keishi KAWABATA ◽

Keishi OKAMOTO

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Pulse Voltage ◽

Bipolar Pulse ◽

Plasma Confinement ◽

Paper Substrate ◽

Cu Films ◽

Inductively Coupled ◽

Magnetic Plasma

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Effect of Substrate Bipolar Pulse Voltage on the Properties of Cu Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.53.184 ◽

2010 ◽

Vol 53 (3) ◽

pp. 184-186 ◽

Cited By ~ 1

Author(s):

Fumiya MORISHIGE ◽

Kazuki OTANI ◽

Satoshi KASAI ◽

Keishi KAWABATA ◽

Keishi OKAMOTO

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Pulse Voltage ◽

Bipolar Pulse ◽

Plasma Confinement ◽

Cu Films ◽

Inductively Coupled ◽

Magnetic Plasma

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Characteristics of Substrate Current in Magnetron Sputtering of Nickel with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Shinku ◽

10.3131/jvsj.48.187 ◽

2005 ◽

Vol 48 (3) ◽

pp. 187-189 ◽

Cited By ~ 3

Author(s):

Kazuaki TAKESAKO ◽

Tsuguhisa MIYAMOTO ◽

Keishi KAWABATA

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Plasma Confinement ◽

Inductively Coupled ◽

Substrate Current ◽

Magnetic Plasma

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Effect of Ion Irradiation for Ni Films prepared on a Flexible Substrate Material Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.58.319 ◽

2015 ◽

Vol 58 (8) ◽

pp. 319-323 ◽

Cited By ~ 1

Author(s):

Sho MIYASHITA ◽

Hiroshi TOYOTA

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Ion Irradiation ◽

Flexible Substrate ◽

Substrate Material ◽

Plasma Confinement ◽

Inductively Coupled ◽

Magnetic Plasma

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Dependence of Substrate DC Bias Voltage on Structural Properties of Nickel Thin Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Shinku ◽

10.3131/jvsj.49.156 ◽

2006 ◽

Vol 49 (3) ◽

pp. 156-158 ◽

Cited By ~ 3

Author(s):

Kazuaki TAKESAKO ◽

Yuta OKAYAMA ◽

Keishi KAWABATA

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Structural Properties ◽

Bias Voltage ◽

Inductively Coupled Plasma ◽

Plasma Confinement ◽

Inductively Coupled ◽

Nickel Thin Films ◽

Dc Bias ◽

Magnetic Plasma

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Bipolar Pulse Bias Effects on the Properties of MgO Reactively Deposited by Inductively Coupled Plasma-Assisted Magnetron Sputtering

Applied Science and Convergence Technology ◽

10.5757/asct.2014.23.3.145 ◽

2014 ◽

Vol 23 (3) ◽

pp. 145-150

Author(s):

Junghoon Joo

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Bipolar Pulse ◽

Inductively Coupled

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Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb05 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB05 ◽

Cited By ~ 4

Author(s):

Kosuke Takenaka ◽

Yuichi Setsuhara ◽

Akinori Ebe

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Controlled Deposition

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A Comparative Study of Nanocrystalline TiAlN Coatings Fabricated by Direct Current and Inductively Coupled Plasma Assisted Magnetron Sputtering

Journal of the Korean Ceramic Society ◽

10.4191/kcers.2014.51.5.375 ◽

2014 ◽

Vol 51 (5) ◽

pp. 375-379 ◽

Cited By ~ 1

Author(s):

Sung-Yong Chun ◽

Se-Chul Kim

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Direct Current ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Growth dynamics and characterization of SiC quantum dots synthesized by low-frequency inductively coupled plasma assisted rf magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.2724791 ◽

2007 ◽

Vol 101 (9) ◽

pp. 094304 ◽

Cited By ~ 24

Author(s):

Q. J. Cheng ◽

J. D. Long ◽

S. Xu

Keyword(s):

Quantum Dots ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Growth Dynamics ◽

Rf Magnetron Sputtering ◽

Inductively Coupled

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Phase transformation of tungsten films deposited by diode and inductively coupled plasma magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1642651 ◽

2004 ◽

Vol 22 (2) ◽

pp. 281-286 ◽

Cited By ~ 13

Author(s):

G. S. Chen ◽

H. S. Tian ◽

C. K. Lin ◽

Gin-Shiang Chen ◽

H. Y. Lee

Keyword(s):

Phase Transformation ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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A study on the low temperature coating process by inductively coupled plasma assisted DC magnetron sputtering

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00071-9 ◽

2003 ◽

Vol 169-170 ◽

pp. 41-44 ◽

Cited By ~ 13

Author(s):

H.D. Na ◽

H.S. Park ◽

D.H. Jung ◽

G.R. Lee ◽

J.H. Joo ◽

...

Keyword(s):

Low Temperature ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Coating Process ◽

Dc Magnetron Sputtering ◽

Inductively Coupled

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