Characterization of a coaxial ECR plasma thruster

2013 ◽  
Author(s):  
Julien Jarrige ◽  
Paul-Quentin Elias ◽  
Denis Packan ◽  
Felix Cannat
Keyword(s):  
Ecr Plasma ◽  
Plasma Thruster

scholarly journals Description and characterization of a ECR plasma device developed for thin film deposition

2003 ◽  
Vol 33 (1) ◽  
pp. 123-127 ◽  
Author(s):  
J.A.S. da Matta ◽  
R.M.O. Galvão ◽  
L. Ruchko ◽  
M.C.A. Fantini ◽  
P.K. Kiyohara
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ecr Plasma ◽  
Plasma Device

Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

2001 ◽  
Vol 390 (1-2) ◽  
pp. 107-112 ◽  
Author(s):  
Jun Xu ◽  
Xinlu Deng ◽  
Jialiang Zhang ◽  
Wenqi Lu ◽  
Tengcai Ma
Keyword(s):  
Magnetron Sputtering ◽  
Plasma Source ◽  
Dc Magnetron Sputtering ◽  
Ecr Plasma ◽  
Cnx Films

Characterization of atomic oxygen from an ECR plasma source

2002 ◽  
Vol 11 (4) ◽  
pp. 361-367 ◽  
Author(s):  
M Naddaf ◽  
V N Bhoraskar ◽  
A B Mandale ◽  
S R Sainkar ◽  
S V Bhoraskar
Keyword(s):  
Atomic Oxygen ◽  
Plasma Source ◽  
Ecr Plasma

Performance characterization of a high efficiency gas-fed pulsed plasma thruster

1997 ◽  
Author(s):  
J. Ziemer ◽  
E. Cubbin ◽  
E. Choueiri ◽  
Daniel Birx ◽  
J. Ziemer ◽  
...  
Keyword(s):  
High Efficiency ◽  
Pulsed Plasma ◽  
Performance Characterization ◽  
Pulsed Plasma Thruster ◽  
Plasma Thruster

scholarly journals Performance Characterization of a Helicon Plasma Thruster with Annular Magnet

2014 ◽  
Vol 12 (ists29) ◽  
pp. Tb_5-Tb_9
Author(s):  
Kazuaki MIYAMOTO ◽  
Kazunori TAKAHASHI ◽  
Koichi TAKAKI ◽  
Tamiya FUJIWARA ◽  
Akira ANDO
Keyword(s):  
Performance Characterization ◽  
Helicon Plasma ◽  
Plasma Thruster

Application of Ftir Spectroscopy to the Characterization of as-Deposited and Chemical Mechanical Polished (CMP) Electron Cyclotron Resonance (ECR) Plasma Based SiO2 Films

1993 ◽  
Vol 324 ◽  
Author(s):  
Mukesh Desai ◽  
Ron Carpio ◽  
Rahul Jairath ◽  
Matt Stell ◽  
Robert Tolles
Keyword(s):  
Ftir Spectroscopy ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Removal Rate ◽  
Electron Cyclotron ◽  
Sources Of Information ◽  
Ecr Plasma ◽  
Rate Information ◽  
Vibrational Bands

AbstractFTIR spectroscopy has been used to characterize as-deposited and chemical mechanical polished (CMP) electron cyclotron resonance (ECR) plasma based SiOx films. The ECR films were deposited at different O2/SiH4 gas ratios in an attempt to vary the film stochiometry. Transmission and reflectance-absorbance IR spectral data were combined with CMP removal rate information to characterize the SiOx films and their polishing behavior. The asymmetric O-Si-O stretching (ASM) and Si-OH vibrational bands were found to be principal sources of information.

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