scholarly journals Low-Temperature Deposition of Silicon Nitride Films by a Cat-CVD Technique-Gas-Phase Diagnoses and Evaluation of Film Properties-

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pp. 142-147
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Atsushi MASUDA ◽  
Hideki MATSUMURA ◽  
Toshiharu MINAMIKAWA ◽  
Akira HEYA ◽  
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pp. P715-P718
Author(s):  
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Katsutoshi Ishii ◽  
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Ki‐Su Keum ◽  
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1983 ◽  
Vol 130 (3) ◽  
pp. 638-644 ◽  
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C. Schwebel ◽  
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