Low-temperature deposition pathways to silicon nitride, amorphous silicon, polycrystalline silicon, and n type amorphous silicon films using a high density plasma system

2002 ◽  
Author(s):  
Sanghoon Bae ◽  
D. Farber ◽  
A. Kalkan ◽  
S. Fonash
Keyword(s):  
Silicon Nitride ◽  
Low Temperature ◽  
Amorphous Silicon ◽  
Polycrystalline Silicon ◽  
High Density ◽  
Silicon Films ◽  
Plasma System ◽  
Low Temperature Deposition ◽  
Temperature Deposition ◽  
Density Plasma

High-Rate Deposition of Amorphous Silicon Films by Microwave-Excited High-Density Plasma

2011 ◽  
Vol 50 ◽  
pp. 036502 ◽  
Author(s):  
Hirotada Inoue ◽  
Kouji Tanaka ◽  
Yuichi Sano ◽  
Takehiro Nishimura ◽  
Akinobu Teramoto ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Density Plasma
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