scholarly journals QUANTITATIVE EVALUATION OF PINHOLE DEFECTS IN TiN FILMS PREPARED BY R.F. REACTIVE SPUTTERING

1999 ◽  
Vol 48 (12Appendix) ◽  
pp. 265-269
Author(s):  
Hitoshi UCHIDA ◽  
Shozo INOUE ◽  
Yasuhide NAKANO ◽  
Keiji KOTERAZAWA
Keyword(s):  
Quantitative Evaluation ◽  
Reactive Sputtering ◽  
Tin Films

Studies on reactive sputtering process of TiN films using small mass analyzers

2001 ◽  
Vol 169-170 ◽  
pp. 757-762 ◽  
Author(s):  
Tatsuya Banno ◽  
Shinichiro Michizono ◽  
Yoshio Saito
Keyword(s):  
Reactive Sputtering ◽  
Small Mass ◽  
Tin Films

Reactive sputtering of TiN films at large substrate to target distances

Vacuum ◽  
1990 ◽  
Vol 40 (5) ◽  
pp. 435-444 ◽  
Author(s):  
J Musil ◽  
S Kadlec
Keyword(s):  
Reactive Sputtering ◽  
Tin Films

RFA as control method of the reactive sputtering process of TiN films

1995 ◽  
Vol 353 (5-8) ◽  
pp. 536-540 ◽  
Author(s):  
T. Stobiecki ◽  
F. Stobiecki ◽  
T. Conradi ◽  
S. Kraegermann ◽  
K. R�ll ◽  
...  
Keyword(s):  
Control Method ◽  
Reactive Sputtering ◽  
Tin Films

scholarly journals Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

2006 ◽  
Vol 73 (4) ◽  
Author(s):  
M. A. Auger ◽  
L. Vázquez ◽  
R. Cuerno ◽  
M. Castro ◽  
M. Jergel ◽  
...  
Keyword(s):  
Reactive Sputtering ◽  
Surface Roughening ◽  
Tin Films ◽  
Anomalous Surface

scholarly journals Deposition of TiN Films onto Glaze of Porcelain by Reactive Sputtering

1991 ◽  
Vol 99 (1156) ◽  
pp. 1219-1223
Author(s):  
Hiromichi ICHINOSE ◽  
Kazuo AKAMATSU ◽  
Makoto TERASAKI ◽  
Hiroaki KATSUKI ◽  
Masamitsu NAGANO
Keyword(s):  
Reactive Sputtering ◽  
Tin Films

Surface and bulk properties of boride/nitride nanoscale films

1997 ◽  
Vol 501 ◽  
Author(s):  
R. A. Adrievski
Keyword(s):  
Mechanical Properties ◽  
Reactive Sputtering ◽  
Inhomogeneous Deformation ◽  
Test Results ◽  
Bulk Properties ◽  
Tin Films ◽  
Nanoscale Films

ABSTRACTNanoscale TiB2/TiN films have been prepared by d.c. and r.f. magnetron non-reactive sputtering and examined by TEM, SAED, SEM, AES, XPS, XRD, AFM as well as nanoindentation. Attention has been focused on both bulk and surface physical-mechanical properties. The effect of the latter on the nanoindentaion test results seems to be very important. Two types of film fracture under a Vickers indentor connected with homogeneous and inhomogeneous deformation have been described.

Influence of substrate shape on TiN films prepared by reactive sputtering

1984 ◽  
Vol 111 (4) ◽  
pp. 313-322 ◽  
Author(s):  
B.O. Johansson ◽  
J.-E. Sundgren ◽  
H.T.G. Hentzell ◽  
S.-E. Karlsson
Keyword(s):  
Reactive Sputtering ◽  
Tin Films ◽  
Influence Of Substrate

scholarly journals Growth of TiN Films on (001) NaCl by rf Reactive Sputtering

1992 ◽  
Vol 56 (11) ◽  
pp. 1322-1328 ◽  
Author(s):  
Shozo Inoue ◽  
Hitoshi Uchida ◽  
Yoichi Tokunaga ◽  
Keiji Koterazawa
Keyword(s):  
Reactive Sputtering ◽  
Tin Films
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