scholarly journals Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

2006 ◽  
Vol 73 (4) ◽  
Author(s):  
M. A. Auger ◽  
L. Vázquez ◽  
R. Cuerno ◽  
M. Castro ◽  
M. Jergel ◽  
...  
Keyword(s):  
Reactive Sputtering ◽  
Surface Roughening ◽  
Tin Films ◽  
Anomalous Surface

Studies on reactive sputtering process of TiN films using small mass analyzers

2001 ◽  
Vol 169-170 ◽  
pp. 757-762 ◽  
Author(s):  
Tatsuya Banno ◽  
Shinichiro Michizono ◽  
Yoshio Saito
Keyword(s):  
Reactive Sputtering ◽  
Small Mass ◽  
Tin Films

Reactive sputtering of TiN films at large substrate to target distances

Vacuum ◽  
1990 ◽  
Vol 40 (5) ◽  
pp. 435-444 ◽  
Author(s):  
J Musil ◽  
S Kadlec
Keyword(s):  
Reactive Sputtering ◽  
Tin Films

RFA as control method of the reactive sputtering process of TiN films

1995 ◽  
Vol 353 (5-8) ◽  
pp. 536-540 ◽  
Author(s):  
T. Stobiecki ◽  
F. Stobiecki ◽  
T. Conradi ◽  
S. Kraegermann ◽  
K. R�ll ◽  
...  
Keyword(s):  
Control Method ◽  
Reactive Sputtering ◽  
Tin Films

scholarly journals Deposition of TiN Films onto Glaze of Porcelain by Reactive Sputtering

1991 ◽  
Vol 99 (1156) ◽  
pp. 1219-1223
Author(s):  
Hiromichi ICHINOSE ◽  
Kazuo AKAMATSU ◽  
Makoto TERASAKI ◽  
Hiroaki KATSUKI ◽  
Masamitsu NAGANO
Keyword(s):  
Reactive Sputtering ◽  
Tin Films

Surface and bulk properties of boride/nitride nanoscale films

1997 ◽  
Vol 501 ◽  
Author(s):  
R. A. Adrievski
Keyword(s):  
Mechanical Properties ◽  
Reactive Sputtering ◽  
Inhomogeneous Deformation ◽  
Test Results ◽  
Bulk Properties ◽  
Tin Films ◽  
Nanoscale Films

ABSTRACTNanoscale TiB2/TiN films have been prepared by d.c. and r.f. magnetron non-reactive sputtering and examined by TEM, SAED, SEM, AES, XPS, XRD, AFM as well as nanoindentation. Attention has been focused on both bulk and surface physical-mechanical properties. The effect of the latter on the nanoindentaion test results seems to be very important. Two types of film fracture under a Vickers indentor connected with homogeneous and inhomogeneous deformation have been described.

scholarly journals QUANTITATIVE EVALUATION OF PINHOLE DEFECTS IN TiN FILMS PREPARED BY R.F. REACTIVE SPUTTERING

1999 ◽  
Vol 48 (12Appendix) ◽  
pp. 265-269
Author(s):  
Hitoshi UCHIDA ◽  
Shozo INOUE ◽  
Yasuhide NAKANO ◽  
Keiji KOTERAZAWA
Keyword(s):  
Quantitative Evaluation ◽  
Reactive Sputtering ◽  
Tin Films

SCALING APPROACH TO ANOMALOUS SURFACE ROUGHENING OF THE (d+1)-DIMENSIONAL MOLECULAR-BEAM EPITAXY GROWTH EQUATIONS

2006 ◽  
Vol 20 (30) ◽  
pp. 1935-1941 ◽  
Author(s):  
HUI XIA ◽  
GANG TANG ◽  
KUI HAN ◽  
DA-PENG HAO ◽  
HUA CHEN ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Molecular Beam Epitaxy Growth ◽  
Surface Roughening ◽  
Dynamic Scaling ◽  
Scaling Analysis ◽  
Local Fluctuations ◽  
Standard Family ◽  
Anomalous Surface ◽  
Growth Equations

To determine anomalous dynamic scaling of continuum growth equations, López12 proposed an analytical approach, which is based on the scaling analysis introduced by Hentschel and Family.15 In this work, we generalize this scaling analysis to the (d+1)-dimensional molecular-beam epitaxy equations to determine their anomalous dynamic scaling. The growth equations studied here include the linear molecular-beam epitaxy (LMBE) and Lai–Das Sarma–Villain (LDV). We find that both the LMBE and LDV equations, when the substrate dimension d>2, correspond to a standard Family–Vicsek scaling, however, when d<2, exhibit anomalous dynamic roughening of the local fluctuations of the growth height. When the growth equations exhibit anomalous dynamic scaling, we obtain the local roughness exponents by using scaling relation α loc =α-zκ, which are consistent with the corresponding numerical results.

Influence of substrate shape on TiN films prepared by reactive sputtering

1984 ◽  
Vol 111 (4) ◽  
pp. 313-322 ◽  
Author(s):  
B.O. Johansson ◽  
J.-E. Sundgren ◽  
H.T.G. Hentzell ◽  
S.-E. Karlsson
Keyword(s):  
Reactive Sputtering ◽  
Tin Films ◽  
Influence Of Substrate
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