scholarly journals 2-Step In-situ Annealing of Sputter Deposited MgB2 Thin Films

Author(s):  
Zon MORI ◽  
Yuichiro ISHIZAKI ◽  
Toshiya DOI ◽  
Yoshinori HAKURAKU ◽  
Michiya OKADA ◽  
...  
1997 ◽  
Vol 292 (1-2) ◽  
pp. 277-281 ◽  
Author(s):  
D.K. Aswal ◽  
S.K. Gupta ◽  
Savita N. Narang ◽  
S.C. Sabharwal ◽  
M.K. Gupta

2002 ◽  
Vol 1 (1) ◽  
pp. 35-38 ◽  
Author(s):  
Xianghui Zeng ◽  
Alexej V. Pogrebnyakov ◽  
Armen Kotcharov ◽  
James E. Jones ◽  
X. X. Xi ◽  
...  

2005 ◽  
Vol 423 (3-4) ◽  
pp. 89-95 ◽  
Author(s):  
R. Schneider ◽  
J. Geerk ◽  
G. Linker ◽  
F. Ratzel ◽  
A.G. Zaitsev ◽  
...  

1986 ◽  
Vol 77 ◽  
Author(s):  
J. C. Hensel ◽  
J. M. Vandenberg ◽  
L. F. Mattheiss ◽  
F. C. Unterwald ◽  
A. Maury

ABSTRACTThe formation of TiSi2 thin films on Si has been investigated by in situ x-ray diffraction and by electrical transport. The x-ray results show unequivocally that the staging proceeds through two orthorhombic polytypes of TiSi2 according to the sequence: sputter-deposited metallic Ti films on Si (001) → TiSi2 (C49 structure) → TiSi2 (C54 structure), with no evidence of lower suicides. Electrical transport shows metallic behavior for all phases and distinctive features in the annealing curves which correlate with the structural transformations. Most importantly, the resistivity, characteristically very high for the C49 phase, undergoes a precipitous drop at the C49 → C54 transition. Total energies for both phases are calculated and, consistent with the occurrence of a structural phase transformation, are found not to differ appreciably.


2004 ◽  
Vol 412-414 ◽  
pp. 1371-1375 ◽  
Author(s):  
Zon Mori ◽  
Toshiya Doi ◽  
Yuichiro Ishizaki ◽  
Hitoshi Kitaguchi ◽  
Michiya Okada ◽  
...  

2006 ◽  
Vol 99 (8) ◽  
pp. 08M512 ◽  
Author(s):  
Yi Bing Zhang ◽  
Hong Mei Zhu ◽  
Shi Ping Zhou ◽  
Shi Ying Ding ◽  
Zhi Wei Lin ◽  
...  
Keyword(s):  

2004 ◽  
Vol 85 (22) ◽  
pp. 5290-5292 ◽  
Author(s):  
R. Schneider ◽  
J. Geerk ◽  
F. Ratzel ◽  
G. Linker ◽  
A. G. Zaitsev

2007 ◽  
Vol 546-549 ◽  
pp. 2027-2030 ◽  
Author(s):  
Yue Zhao ◽  
Yi Sun Wu ◽  
S.X. Dou ◽  
T. Tajima ◽  
O.S. Romanenko

MgB2 thin films have been coated on Nb substrates without any buffer layers. An in situ pulsed laser deposition (PLD) method was used to prepare the coating. The interface between films and substrates has been characterized by scanning electron microscopy (SEM). Surface impedance has been measured for the MgB2 films on Nb substrates. The results were discussed with regard to the potential large scale applications in superconducting RF cavities.


1999 ◽  
Vol 354 (1-2) ◽  
pp. 195-200 ◽  
Author(s):  
Z. Mori ◽  
S. Nozoe ◽  
N. Yokoyama ◽  
S. Koba ◽  
T. Doi ◽  
...  

1999 ◽  
Vol 14 (11) ◽  
pp. 4307-4318 ◽  
Author(s):  
S. Hiboux ◽  
P. Muralt ◽  
T. Maeder

In situ reactively sputter deposited, 300-nm-thick Pb(Zrx, Ti1−x)O3 thin films were investigated as a function of composition, texture, and different electrodes (Pt,RuO2).X-ray diffraction analysis, ferroelectric, dielectric, and piezoelectric measurements were carried out. While for dielectric properties bulklike contributions from lattice as well as from domains are observed, domain wall contributions to piezoelectric properties are very much reduced in the morphotropic phase boundary (MPB) region. Permittivity and d33 do not peak at the same composition; the MPB region is broadened up and generally shifted to the tetragonal side.


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