Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane
2019 ◽
Vol 19
(1)
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pp. 47
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Keyword(s):
Polyindene (PIn) membrane was fabricated onto a zeolite 5A substrate by using plasma-enhanced chemical vapor deposition (PECVD) at low temperature. Membrane characterization was done by taking Scanning Electron Microscopy (SEM) and FT-IR measurements and the new peak was found in the plasma-derived PIn film. Membrane performance was analyzed by checking permeability of pure gases (H2, N2, and CO2) through the membrane. PECVD-derived PIn membrane showed high gas barrier properties and selectivities of 8.2 and 4.0 for H2/CO2 and H2/N2, respectively, at room temperature
2017 ◽
Vol 57
(6)
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pp. 581-590
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Keyword(s):
2000 ◽
Vol 15
(3)
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pp. 704-717
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2013 ◽
Vol 228
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pp. S490-S494
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2009 ◽
Vol 255
(7)
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pp. 3983-3988
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2010 ◽
Vol 7
(11)
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pp. 939-950
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Keyword(s):
2000 ◽
Vol 77
(3)
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pp. 282-287
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2004 ◽
Vol 22
(5)
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pp. 2375
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