Characterization of GeO2Sub-monolayers on SiO2Prepared by Chemical Vapor Deposition of Ge(OMe)4by EXAFS, FT-IR, and XRD

K. Okumura; K. Asakura; Y. Iwasawa

doi:10.1021/la970262n

Characterization of GeO2Sub-monolayers on SiO2Prepared by Chemical Vapor Deposition of Ge(OMe)4by EXAFS, FT-IR, and XRD

Langmuir ◽

10.1021/la970262n ◽

1998 ◽

Vol 14 (13) ◽

pp. 3607-3613 ◽

Cited By ~ 12

Author(s):

K. Okumura ◽

K. Asakura ◽

Y. Iwasawa

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Ft Ir

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Chemical vapor deposition growth and characterization of AlGaN nanowires

JOURNAL OF SHENZHEN UNIVERSITY SCIENCE AND ENGINEERING ◽

10.3724/sp.j.1249.2015.06638 ◽

2015 ◽

Vol 32 (6) ◽

pp. 638

Author(s):

Xingmin Cai ◽

Xiaoqiang Su ◽

Fan Ye ◽

Huan Wang ◽

Guangxing Liang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth

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Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

Applied Physics Express ◽

10.35848/1882-0786/ab9a8f ◽

2020 ◽

Vol 13 (7) ◽

pp. 075505

Author(s):

Tomohiro Yamaguchi ◽

Hiroki Nagai ◽

Takanori Kiguchi ◽

Nao Wakabayashi ◽

Takuto Igawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

Α Al2o3

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Chemical Vapor Deposition Synthesis and Characterization of Hollow Carbon Nanospheres with High Specific Capacitance and Excellent Cycling Stability

Journal of Electronic Materials ◽

10.1007/s11664-021-08818-7 ◽

2021 ◽

Author(s):

Mehrdad Teymourzadeh ◽

Majid Seifi ◽

Mohammad Bagher Askari

Keyword(s):

Chemical Vapor Deposition ◽

Specific Capacitance ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Specific Capacitance ◽

Synthesis And Characterization ◽

Carbon Nanospheres ◽

Excellent Cycling Stability ◽

Hollow Carbon

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Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET

Journal of Electronic Materials ◽

10.1007/s11664-021-09038-9 ◽

2021 ◽

Author(s):

A. Ramos-Carrazco ◽

J. A. Gallardo-Cubedo ◽

A. Vera-Marquina ◽

A. L. Leal-Cruz ◽

J. R. Noriega ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Active Layer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Zno Films

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Surface characterization of mesoporous biomass activated carbon modified by thermal chemical vapor deposition and adsorptive mechanism of nitrate ions in aqueous solution

Colloids and Surfaces A Physicochemical and Engineering Aspects ◽

10.1016/j.colsurfa.2021.126213 ◽

2021 ◽

pp. 126213

Author(s):

Jinghan Yuan ◽

Yoshimasa Amano ◽

Motoi Machida

Keyword(s):

Aqueous Solution ◽

Activated Carbon ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Surface Characterization ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Nitrate Ions ◽

Adsorptive Mechanism

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Characterization of Microcrystalline Silicon Thin Film Solar Cells Prepared by High Working Pressure Plasma-enhanced Chemical Vapor Deposition

2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2017.8366297 ◽

2017 ◽

Author(s):

Jung-Dae Kwon ◽

Dong-Ho Kim ◽

Ji-Hoon Lee ◽

Myungkwan Song ◽

Myunghun Shin

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Solar Cells ◽

Microcrystalline Silicon ◽

Silicon Thin Film ◽

Working Pressure ◽

High Working Pressure

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Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1470510 ◽

2002 ◽

Vol 20 (3) ◽

pp. 828 ◽

Cited By ~ 12

Author(s):

Hongqiang Lu ◽

Hao Cui ◽

Ishwara Bhat ◽

Shyam Murarka ◽

Williams Lanford ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Oxide Film ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Silicon Oxide Film ◽

Doped Silicon ◽

Deposition Technology

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Characterization of Undoped, N- and P-Type Hydrogenated Nanocrystalline Silicon Carbide Films Deposited by Hot-Wire Chemical Vapor Deposition at Low Temperatures

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.1415 ◽

2007 ◽

Vol 46 (4A) ◽

pp. 1415-1426 ◽

Cited By ~ 46

Author(s):

Shinsuke Miyajima ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Nanocrystalline Silicon Carbide ◽

P Type

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ChemInform Abstract: Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199406262 ◽

2010 ◽

Vol 25 (6) ◽

pp. no-no

Author(s):

X.-L. XU ◽

P. K. MCLARTY ◽

H. BRUSH ◽

V. MISRA ◽

J. J. WORTMAN ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Oxynitride ◽

Thermal Chemical Vapor Deposition ◽

Abstract Characterization ◽

Thin Silicon

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Chemical Vapor Deposition and Characterization of Aligned and Incommensurate Graphene/Hexagonal Boron Nitride Heterostack on Cu(111)

Nano Letters ◽

10.1021/nl400815w ◽

2013 ◽

Vol 13 (6) ◽

pp. 2668-2675 ◽

Cited By ~ 90

Author(s):

Silvan Roth ◽

Fumihiko Matsui ◽

Thomas Greber ◽

Jürg Osterwalder

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Hexagonal Boron Nitride ◽

Chemical Vapor

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