Room Temperature Fabrication of Thin Oxide Films by Laser Induced Metalorganic Chemical Vapor Deposition.

Koji TOKITA; Fumio OKADA; Hideo SEGAWA

doi:10.2184/lsj.23.355

Room Temperature Fabrication of Thin Oxide Films by Laser Induced Metalorganic Chemical Vapor Deposition.

The Review of Laser Engineering ◽

10.2184/lsj.23.355 ◽

1995 ◽

Vol 23 (5) ◽

pp. 355-363 ◽

Cited By ~ 2

Author(s):

Koji TOKITA ◽

Fumio OKADA ◽

Hideo SEGAWA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Thin Oxide Films ◽

Thin Oxide ◽

Metalorganic Chemical

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Corrosion Resistant Multiple Layer Thin Oxide Films Prepared by Metalorganic Chemical Vapor Deposition

Journal of the Japan Institute of Metals and Materials ◽

10.2320/jinstmet1952.51.11_1054 ◽

1987 ◽

Vol 51 (11) ◽

pp. 1054-1059 ◽

Cited By ~ 2

Author(s):

Morio Ishikawa ◽

Katsuhisa Sugimoto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Corrosion Resistant ◽

Multiple Layer ◽

Thin Oxide Films ◽

Thin Oxide ◽

Metalorganic Chemical

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NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1448 ◽

1993 ◽

Vol 32 (Part 2, No. 10A) ◽

pp. L1448-L1450 ◽

Cited By ~ 51

Author(s):

Eiji Fujii ◽

Atsushi Tomozawa ◽

Satoru Fujii ◽

Hideo Torii ◽

Masumi Hattori ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Metalorganic Chemical

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First Room-Temperature Continuous-Wave Operation of Self-Formed InGaAs Quantum Dot-Like Laser on Si substrate Grown by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.3860 ◽

2000 ◽

Vol 39 (Part 1, No. 7A) ◽

pp. 3860-3862 ◽

Cited By ~ 9

Author(s):

Zaman Iqbal Kazi ◽

Takashi Egawa ◽

Takashi Jimbo ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Dot ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Si Substrate ◽

Continuous Wave Operation ◽

Metalorganic Chemical

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Room-temperature optical transitions in Mg-doped cubic GaN/GaAs(100) grown by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.372139 ◽

2000 ◽

Vol 87 (4) ◽

pp. 2064-2066 ◽

Cited By ~ 8

Author(s):

Dapeng Xu ◽

Hui Yang ◽

D. G. Zhao ◽

S. F. Li ◽

R. H. Wu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Optical Transitions ◽

Cubic Gan ◽

Metalorganic Chemical ◽

Mg Doped

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Room‐temperature excitons in Ga0.47In0.53As‐InP superlattices grown by low‐pressure metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.97437 ◽

1986 ◽

Vol 49 (17) ◽

pp. 1110-1111 ◽

Cited By ~ 23

Author(s):

M. Razeghi ◽

J. Nagle ◽

P. Maurel ◽

F. Omnes ◽

J. P. Pocholle

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Substrate, annealing, and Mn excess effects on La–Ca–MnO3 thin films grown by metalorganic chemical vapor deposition: A way to room-temperature Tc

Journal of Applied Physics ◽

10.1063/1.369994 ◽

1999 ◽

Vol 85 (8) ◽

pp. 5411-5413 ◽

Cited By ~ 15

Author(s):

P. B. Tavares ◽

V. S. Amaral ◽

J. P. Araújo ◽

J. B. Sousa ◽

A. A. C. S. Lourenço ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Substrate Annealing ◽

Metalorganic Chemical

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Room‐temperature laser operation of quantum‐well Ga(1−x)AlxAs‐GaAs laser diodes grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.90026 ◽

1978 ◽

Vol 32 (5) ◽

pp. 295-297 ◽

Cited By ~ 125

Author(s):

R. D. Dupuis ◽

P. D. Dapkus ◽

Nick Holonyak ◽

E. A. Rezek ◽

R. Chin

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Well ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Laser Diodes ◽

Chemical Vapor ◽

Laser Operation ◽

Gaas Laser ◽

Metalorganic Chemical

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Continuous-wave room-temperature operation of InGaN/GaN multiquantum well lasers grown by low-pressure metalorganic chemical vapor deposition

10.1117/12.304463 ◽

1998 ◽

Cited By ~ 2

Author(s):

Manijeh Razeghi ◽

Adam W. Saxler ◽

Patrick Kung ◽

Danielle Walker ◽

Xiaolong Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical ◽

Room Temperature Operation ◽

Multiquantum Well

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Growth of Hafnium Oxide Films by Metalorganic Chemical Vapor Deposition Using Oxygen-Free Hf[N(C2H5)2]4 Precursor and Their Properties

Integrated Ferroelectrics ◽

10.1080/714040774 ◽

2003 ◽

Vol 57 (1) ◽

pp. 1185-1192

Author(s):

K. Takahashi ◽

M. Nakayama ◽

S. Hino ◽

E. Tokumitsu ◽

H. Funakubo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hafnium Oxide ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Metalorganic Chemical

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TA-B9 1800-hour continuous operation of CW room-temperature AlxGa1-xAs-GaAs heterostructure lasers grown by metalorganic chemical vapor deposition

IEEE Transactions on Electron Devices ◽

10.1109/t-ed.1979.19725 ◽

1979 ◽

Vol 26 (11) ◽

pp. 1837-1838 ◽

Cited By ~ 1

Author(s):

R.D. Dupuis

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Continuous Operation ◽

Metalorganic Chemical

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