Continuous-wave room-temperature operation of InGaN/GaN multiquantum well lasers grown by low-pressure metalorganic chemical vapor deposition

Mapping Intimacies ◽

10.1117/12.304463 ◽

1998 ◽

Cited By ~ 2

Author(s):

Manijeh Razeghi ◽

Adam W. Saxler ◽

Patrick Kung ◽

Danielle Walker ◽

Xiaolong Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical ◽

Room Temperature Operation ◽

Multiquantum Well

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Room‐temperature continuous‐wave operation of a GaInP/AlGaInP multiquantum well laser grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.97961 ◽

1987 ◽

Vol 50 (16) ◽

pp. 1033-1034 ◽

Cited By ~ 25

Author(s):

M. Ikeda ◽

A. Toda ◽

K. Nakano ◽

Y. Mori ◽

N. Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Continuous Wave Operation ◽

Metalorganic Chemical ◽

Multiquantum Well

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First Room-Temperature Continuous-Wave Operation of Self-Formed InGaAs Quantum Dot-Like Laser on Si substrate Grown by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.3860 ◽

2000 ◽

Vol 39 (Part 1, No. 7A) ◽

pp. 3860-3862 ◽

Cited By ~ 9

Author(s):

Zaman Iqbal Kazi ◽

Takashi Egawa ◽

Takashi Jimbo ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Dot ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Si Substrate ◽

Continuous Wave Operation ◽

Metalorganic Chemical

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Room‐temperature excitons in Ga0.47In0.53As‐InP superlattices grown by low‐pressure metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.97437 ◽

1986 ◽

Vol 49 (17) ◽

pp. 1110-1111 ◽

Cited By ~ 23

Author(s):

M. Razeghi ◽

J. Nagle ◽

P. Maurel ◽

F. Omnes ◽

J. P. Pocholle

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Vertical‐cavity, room‐temperature stimulated emission from photopumped GaN films deposited over sapphire substrates using low‐pressure metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.105163 ◽

1991 ◽

Vol 58 (14) ◽

pp. 1515-1517 ◽

Cited By ~ 87

Author(s):

M. Asif Khan ◽

D. T. Olson ◽

J. M. Van Hove ◽

J. N. Kuznia

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Stimulated Emission ◽

Sapphire Substrates ◽

Vertical Cavity ◽

Metalorganic Chemical

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Room‐temperature continuous‐wave operation of an AlGaInP double heterostructure laser grown by atmospheric pressure metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.96366 ◽

1985 ◽

Vol 47 (10) ◽

pp. 1027-1028 ◽

Cited By ~ 106

Author(s):

Masao Ikeda ◽

Yoshifumi Mori ◽

Hiromitsu Sato ◽

Kunio Kaneko ◽

Naozo Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Heterostructure Laser ◽

Continuous Wave Operation ◽

Metalorganic Chemical

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Room‐temperature operation of distributed‐Bragg‐confinement Ga1−xAlxAs‐GaAs lasers grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.90147 ◽

1978 ◽

Vol 33 (1) ◽

pp. 68-69 ◽

Cited By ~ 24

Author(s):

R. D. Dupuis ◽

P. D. Dapkus

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical ◽

Room Temperature Operation

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Short‐wavelength room‐temperature continuous‐wave laser operation of InAlP‐InGaP superlattices grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.112181 ◽

1994 ◽

Vol 65 (7) ◽

pp. 854-856 ◽

Cited By ~ 9

Author(s):

R. V. Chelakara ◽

M. R. Islam ◽

J. G. Neff ◽

K. G. Fertitta ◽

A. L. Holmes ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Laser Operation ◽

Continuous Wave Laser ◽

Wave Laser ◽

Metalorganic Chemical

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Room-temperature continuous-wave operation of GaN-based laser diodes grown by raised-pressure metalorganic chemical vapor deposition

Journal of Electronic Materials ◽

10.1007/s11664-999-0028-8 ◽

1999 ◽

Vol 28 (3) ◽

pp. 287-289 ◽

Cited By ~ 18

Author(s):

Katsunori Yanashima ◽

Shigeki Hashimoto ◽

Tomonori Hino ◽

Kenji Funato ◽

Toshimasa Kobayashi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Continuous Wave ◽

Laser Diodes ◽

Chemical Vapor ◽

Continuous Wave Operation ◽

Metalorganic Chemical

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Room-Temperature Pulsed Operation of GaN-Based Laser Diodes on a-Face Sapphire Substrate Grown by Low-Pressure Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.l1231 ◽

1998 ◽

Vol 37 (Part 2, No. 10B) ◽

pp. L1231-L1233 ◽

Cited By ~ 6

Author(s):

Yoshinori Kimura ◽

Mamoru Miyachi ◽

Hirokazu Takahashi ◽

Toshiyuki Tanaka ◽

Mitsuru Nishitsuka ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Sapphire Substrate ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Laser Diodes ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Continuous room‐temperature operation of Ga(1−x)AlxAs‐GaAs double‐heterostructure lasers grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.90085 ◽

1978 ◽

Vol 32 (7) ◽

pp. 406-407 ◽

Cited By ~ 43

Author(s):

R. D. Dupuis ◽

P. D. Dapkus

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructure ◽

Metalorganic Chemical ◽

Room Temperature Operation

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