scholarly journals Low-pressure chemical vapor deposition of amorphous silicon photovoltaic devices. Annual technical progress report, 1 May 1984-30 April 1985

1986 ◽  
Author(s):  
B. Baron ◽  
R. Rocheleau ◽  
S. Hegedus
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Silicon ◽  
Technical Progress ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Progress Report ◽  
Photovoltaic Devices ◽  
Pressure Chemical

Ex situellipsometry characterization of excimer laser annealed amorphous silicon thin films grown by low pressure chemical vapor deposition

1997 ◽  
Vol 71 (3) ◽  
pp. 359-361 ◽  
Author(s):  
Chau-Hong Kuo ◽  
In-Cha Hsieh ◽  
Dieter K. Schroder ◽  
George N. Maracas ◽  
Sheau Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Amorphous Silicon ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Thin Films ◽  
Pressure Chemical
Sign in / Sign up

Export Citation Format

Share Document