scholarly journals In-situ monitoring of etch by-products during reactive ion beam etching of GaAs in chlorine/argon

1997 ◽  
Author(s):  
J.W. Lee ◽  
S.J. Pearton ◽  
C.R. Abernathy ◽  
G.A. Vawter ◽  
R.J. Shul ◽  
...  
Keyword(s):  
Ion Beam ◽  
In Situ Monitoring ◽  
Ion Beam Etching ◽  
By Products ◽  
Reactive Ion Beam Etching

scholarly journals In-Situ Monitoring Of Etch By-Products During Reactive Ion Beam Etching Of Gaas In Chlorine/Argon

1997 ◽  
Vol 483 ◽  
Author(s):  
J. W. Lee ◽  
S. J. Pearton ◽  
C. R. Abernathy ◽  
G. A. Vawter ◽  
R. J. Shul ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Ion Beam ◽  
Beam Current ◽  
In Situ Monitoring ◽  
Ion Beam Etching ◽  
Inductively Coupled ◽  
Ar Gas ◽  
Product Species ◽  
Reactive Ion Beam Etching

AbstractMass spectrometry of the plasma effluent during Reactive Ion Beam Etching (RIBE) of GaAs using an Inductively Coupled Plasma (ICP) source and a Cl2/Ar gas chemistry shows that AsCl3, AsCl2 and AsCl are all detected as etch products for As, while GaCl2 is the main signal detected for the Ga products. The variation in selective ion currents for the various etch products has been examined as a function of chuck temperature (30–100°C), percentage Cl2 in the gas flow, beam current (60–180 mA) and beam voltage (200–800 V). The results are consistent with AsCl3 and GaCl3 being the main etch product species under our conditions, with fragmentation being responsible for the observed mass spectra.

Reactive Ion Beam Etching Using a Selective Gallium Doping Method

1989 ◽  
Vol 28 (Part 2, No. 9) ◽  
pp. L1671-L1672
Author(s):  
Kyusaku Nishioka ◽  
Hiroaki Morimoto ◽  
Yoji Mashiko ◽  
Tadao Kato
Keyword(s):  
Ion Beam ◽  
Ion Beam Etching ◽  
Gallium Doping ◽  
Reactive Ion Beam Etching
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