An in situ study of the reactive ion beam etching of tungsten with tetrafluoromethane/argon mixtures using ion scattering spectroscopy and secondary ion mass spectrometry

1990 ◽  
Vol 8 (3) ◽  
pp. 1685-1689 ◽  
Author(s):  
T. I. Cox ◽  
D. G. Armour ◽  
V. G. I. Deshmukh
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Ion Beam ◽  
Ion Scattering ◽  
Ion Beam Etching ◽  
In Situ Study ◽  
Ion Scattering Spectroscopy ◽  
Secondary Ion ◽  
Reactive Ion Beam Etching

An ion beam system for ion scattering, bombardment induced light emission and secondary ion mass spectrometry

Vacuum ◽  
1984 ◽  
Vol 34 (1-2) ◽  
pp. 217-221
Author(s):  
DG Armour ◽  
JJ Jimenez-Rodriguez ◽  
CH Barber ◽  
K Snowdon ◽  
P Hedbavny
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Light Emission ◽  
Ion Beam ◽  
Ion Scattering ◽  
Beam System ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Ion beam processing of LiNbO3

1986 ◽  
Vol 1 (1) ◽  
pp. 104-113 ◽  
Author(s):  
B. R. Appleton ◽  
G. M. Beardsley ◽  
G. C. Farlow ◽  
W. H. Christie ◽  
P. R. Ashley
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Ion Beam ◽  
Heavy Ion ◽  
Ion Scattering ◽  
Ion Beam Mixing ◽  
Near Surface ◽  
Alternative Techniques ◽  
Surface Decomposition ◽  
Secondary Ion

Ion implantation and ion beam mixing have been investigated as alternative techniques to hightemperature diffusion for introducing dopants into LiNbO3. Heavy ion bombardment at both 77 and 300 K initiated a near-surface decomposition causing Li to diffuse to the surface where it formed a nonuniform agglomerate. The damage and annealing characteristics of this effect were studied by ion scattering/channeling, secondary ion mass spectrometry, and optical microscopy. The origins of the surface decomposition are discussed along with possible solutions, and selected samples were evaluated for waveguide properties.

Sign in / Sign up

Export Citation Format

Share Document