Influence of substrate temperature on the structural and optoelectronic properties of ZnMgO:Al coatings deposited by radio frequency magnetron sputtering

Du-Cheng TSAI; Feng-Kuan CHEN; Zue-Chin CHANG; Bing-Hau KUO; Erh-Chiang CHEN; Yen-Lin HUANG; Fuh-Sheng SHIEU

doi:10.2109/jcersj2.21062

Influence of substrate temperature on the structural and optoelectronic properties of ZnMgO:Al coatings deposited by radio frequency magnetron sputtering

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj2.21062 ◽

2021 ◽

Vol 129 (12) ◽

pp. 714-719

Author(s):

Du-Cheng TSAI ◽

Feng-Kuan CHEN ◽

Zue-Chin CHANG ◽

Bing-Hau KUO ◽

Erh-Chiang CHEN ◽

...

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Radio Frequency ◽

Optoelectronic Properties ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Influence Of Substrate ◽

Structural And Optoelectronic Properties

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Structural and optoelectronic properties of Al-doped zinc oxide films deposited on flexible substrates by radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2011.05.017 ◽

2011 ◽

Vol 519 (22) ◽

pp. 7959-7965 ◽

Cited By ~ 23

Author(s):

C.H. Tseng ◽

C.H. Huang ◽

H.C. Chang ◽

D.Y. Chen ◽

C.P. Chou ◽

...

Keyword(s):

Zinc Oxide ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Oxide Films ◽

Optoelectronic Properties ◽

Radio Frequency Magnetron ◽

Flexible Substrates ◽

Radio Frequency Magnetron Sputtering ◽

Zinc Oxide Films ◽

Structural And Optoelectronic Properties

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Relation between surface and bulk electronic properties of Al doped ZnO films deposited at varying substrate temperature by radio frequency magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.4923224 ◽

2015 ◽

Vol 117 (24) ◽

pp. 245312 ◽

Cited By ~ 16

Author(s):

C. C. Singh ◽

T. A. Patel ◽

E. Panda

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Radio Frequency ◽

Electronic Properties ◽

Radio Frequency Magnetron ◽

Zno Films ◽

Radio Frequency Magnetron Sputtering ◽

Doped Zno

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Optoelectronic properties and anisotropic stress of Mo:ZnO thin films deposited on flexible substrates by radio frequency magnetron sputtering

Applied Optics ◽

10.1364/ao.383440 ◽

2020 ◽

Vol 59 (5) ◽

pp. 1454 ◽

Cited By ~ 2

Author(s):

Hsi-Chao Chen ◽

Guan-Ting Peng ◽

Tan-Fu Liu

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Optoelectronic Properties ◽

Radio Frequency Magnetron ◽

Flexible Substrates ◽

Radio Frequency Magnetron Sputtering ◽

Anisotropic Stress

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Influence of substrate bias on the structure and properties of TiCN films deposited by radio-frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2016.08.047 ◽

2016 ◽

Vol 616 ◽

pp. 521-529 ◽

Cited By ~ 19

Author(s):

N. Saoula ◽

N. Madaoui ◽

R. Tadjine ◽

R.M. Erasmus ◽

S. Shrivastava ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Substrate Bias ◽

Structure And Properties ◽

Radio Frequency Magnetron Sputtering ◽

Influence Of Substrate

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Effect of Substrate Temperature on (Micro/Nano)Structure of a-SiC:H Thin Films Deposited by Radio-Frequency Magnetron Sputtering.

The Journal of Physical Chemistry C ◽

10.1021/jp3079937 ◽

2012 ◽

Vol 116 (39) ◽

pp. 21018-21026 ◽

Cited By ~ 14

Author(s):

Mohsen Daouahi ◽

Najeh Rekik

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Nano Structure

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Effect of substrate temperature on the crystallization of Pb(Zr,Ti)O3 films on Pt/Ti/Si substrates prepared by radio frequency magnetron sputtering with a stoichiometric oxide target

Materials Science and Engineering B ◽

10.1016/s0921-5107(02)00161-7 ◽

2002 ◽

Vol 95 (1) ◽

pp. 36-42 ◽

Cited By ~ 26

Author(s):

Reji Thomas ◽

Shoichi Mochizuki ◽

Toshiyuki Mihara ◽

Tadashi Ishida

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Si Substrates

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Influence of substrate direct current bias voltage on microcrystalline silicon growth during radio-frequency magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2007.11.004 ◽

2008 ◽

Vol 82 (8) ◽

pp. 777-781 ◽

Cited By ~ 4

Author(s):

A. Tabata ◽

K. Fukaya ◽

T. Mizutani

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Direct Current ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Microcrystalline Silicon ◽

Direct Current Bias ◽

Silicon Growth ◽

Influence Of Substrate

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Effect of substrate temperature on F and Al co-doped ZnO films deposited by radio frequency magnetron sputtering

Solar Energy ◽

10.1016/j.solener.2019.09.095 ◽

2019 ◽

Vol 194 ◽

pp. 471-477 ◽

Cited By ~ 3

Author(s):

Yanfeng Wang ◽

Jianmin Song ◽

Jie Zhang ◽

Guoxi Zheng ◽

Xiaochen Duan ◽

...

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zno Films ◽

Radio Frequency Magnetron Sputtering ◽

Doped Zno ◽

Co Doped

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Influence of substrate bias voltage on the properties of TiO 2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications

Applied Surface Science ◽

10.1016/j.apsusc.2016.07.101 ◽

2017 ◽

Vol 395 ◽

pp. 72-77 ◽

Cited By ~ 21

Author(s):

L. Bait ◽

L. Azzouz ◽

N. Madaoui ◽

N. Saoula

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Radio Frequency Magnetron ◽

Substrate Bias ◽

Radio Frequency Magnetron Sputtering ◽

Substrate Bias Voltage ◽

Influence Of Substrate

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Effect of substrate temperature on structural and optical properties of radio‐frequency magnetron sputtering Ce 0.97 Co 0.03 O 2 thin films

physica status solidi (a) ◽

10.1002/pssa.202100630 ◽

2022 ◽

Author(s):

Shenghong Yang ◽

Yueli Zhang

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Optical Properties

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