scholarly journals Developments of Basic Researches on Fluorocarbon Plasmas for Material Processing. 6. Surface Reaction Process of Fluorocarbon Radicals (CFx).

1999 ◽  
Vol 75 (7) ◽  
pp. 813-820
Author(s):  
Masaru HORI ◽  
Masafumi ITOH ◽  
Toshio GOTO
Keyword(s):  
Material Processing ◽  
Surface Reaction ◽  
Reaction Process ◽  
Fluorocarbon Plasmas

The investigation of the germanium distribution for the optimization of the surface reaction process

1997 ◽  
Vol 298 (1-2) ◽  
pp. 177-181
Author(s):  
Yasuhiro Yoshida ◽  
Shigeru Kubota ◽  
Hiroshi Koezuka
Keyword(s):  
Surface Reaction ◽  
Reaction Process

Laser Chemical Etching of Conducting and Semiconducting Materials

1982 ◽  
Vol 17 ◽  
Author(s):  
T. J. Chuang
Keyword(s):  
Material Processing ◽  
Laser Radiation ◽  
Reaction Mechanisms ◽  
Chemical Etching ◽  
Surface Reaction ◽  
Semiconducting Materials ◽  
Laser Method ◽  
Experimental Approaches ◽  
Product Species ◽  
Insight Into

ABSTRACTThe purpose of the paper is to examine the basic processes involved in the laser-enhanced chemical etching of solids. Specifically, the process of chemisorption, the reaction between the adsorbate and substrate atoms and the vaporization of product species affected by the laser radiation are discussed. It is shown that the laser method can provide important insight into the gas-surface reaction mechanisms. In addition, a number of examples are given to demonstrate the potential of the technique for applications to material processing. Some current studies on the laser-induced chemical etching of materials relevant to microelectronics are reviewed. Certain practical experimental approaches are also considered.

Sign in / Sign up

Export Citation Format

Share Document